Showing results 1 to 4 of 4
Title | Author(s) | Issue Date | Views | |
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Effects of Ge concentration on SiGe oxidation behavior Journal:Applied Physics Letters | 1991 | 177 | ||
Formation of stoichiometric SiGe oxide by electron cyclotron resonance plasma Journal:Applied Physics Letters | 1992 | 207 | ||
Interfacial reactions and Schottky barriers of Pt and Pd on epitaxial Si1-xGex alloys Journal:Applied Physics Letters | 1992 | 177 | ||
Nonalloyed ohmic contacts to n-Si using a strained Si0.50Ge 0.50 buffer layer Journal:Applied Physics Letters | 1993 | 168 |