Showing results 7 to 21 of 21
< previous
| Title | Author(s) | Issue Date | Views | |
|---|---|---|---|---|
| 2004 | 99 | |||
Effects of grid-placed contacts on circuit performance Proceeding/Conference:Proceedings of SPIE | 2003 | 100 | ||
| 2001 | 100 | |||
Feasibility of 50-nm device manufacture by 157-nm optical lithography: an initial assessment Proceeding/Conference:IEEE Hong Kong Electron Devices Meeting Proceedings | 2002 | 151 | ||
Modeling the effects of patterning error on MOSFET Proceeding/Conference:International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT | 2004 | 101 | ||
The nebulous hotspot and algorithm variability Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering | 2009 | 161 | ||
Optimum mask and source patterns to print a given shape Journal:Journal of Microlithography, Microfabrication, and Microsystems | 2002 | 121 | ||
Optimum mask and source patterns to print a given shape Proceeding/Conference:Proceedings of SPIE | 2001 | 113 | ||
Placement sensitivity to aberration in optical imaging Proceeding/Conference:IEEE Conference on Electron Devices and Solid-State Circuits | 2003 | 121 | ||
Quantification of image quality Proceeding/Conference:SPIE - International Society for Optical Engineering. Proceedings | 2002 | 118 | ||
Sensitivity of 1D mask features towards aberration in photolithography Proceeding/Conference:Regional Inter-University Postgraduate Electrical and Electronic Engineering Conference | 2003 | 190 | ||
Standard cell layout with grid-placed contacts Proceeding/Conference:Regional Inter-University Postgraduate Electrical and Electronic Engineering Conference | 2003 | 105 | ||
| 2002 | 94 | |||
Theoretical discussion on reduced aberration sensitivity of enhanced alternating phase-shifting masks Proceeding/Conference:Proceedings of SPIE | 2002 | 101 | ||
| 2001 | 99 |