Showing results 1 to 2 of 2
Title | Author(s) | Issue Date | Views | |
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Characterization of linewidth variation on 248- and 193-nm exposure tools Proceeding/Conference:Proceedings of SPIE | 2001 | 184 | ||
Optimum mask and source patterns to print a given shape Journal:Journal of Microlithography, Microfabrication, and Microsystems | 2002 | 130 |