Showing results 1 to 2 of 2
Title | Author(s) | Issue Date | Views | |
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Alternating phase-shifting mask with reduced aberration sensitivity: lithography considerations Proceeding/Conference:Proceedings of SPIE | 2001 | 163 | ||
Optimum mask and source patterns to print a given shape Proceeding/Conference:Proceedings of SPIE | 2001 |