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Article: Biologic stability of plasma ion-implanted miniscrews

TitleBiologic stability of plasma ion-implanted miniscrews
Authors
Cho, YCCha, JYHwang, CJPark, YCJung, HSYu, HS
KeywordsHistology
Orthodontic mini-implant
Stability
Surface treatment
Issue Date2013
PublisherDaehan Chigwa Gyojeong Haghoe. The Journal's web site is located at http://www.kjo.or.kr/
Citation
The Korean Journal of Orthodontics, 2013, v. 43 n. 3, p. 120-126 How to Cite?
DOI: http://dx.doi.org/10.4041/kjod.2013.43.3.120
Persistent Identifierhttp://hdl.handle.net/10722/184429
ISSN
2005-372X
2021 Impact Factor: 1.361
2020 SCImago Journal Rankings: 0.715
PubMed Central ID
PMC3694203
ISI Accession Number ID
WOS:000320910000003

 

DC FieldValueLanguage
dc.contributor.authorCho, YCen_US
dc.contributor.authorCha, JYen_US
dc.contributor.authorHwang, CJen_US
dc.contributor.authorPark, YCen_US
dc.contributor.authorJung, HSen_US
dc.contributor.authorYu, HSen_US
dc.date.accessioned2013-07-15T09:45:35Z-
dc.date.available2013-07-15T09:45:35Z-
dc.date.issued2013en_US
dc.identifier.citationThe Korean Journal of Orthodontics, 2013, v. 43 n. 3, p. 120-126en_US
dc.identifier.issn2005-372X-
dc.identifier.urihttp://hdl.handle.net/10722/184429-
dc.languageengen_US
dc.publisherDaehan Chigwa Gyojeong Haghoe. The Journal's web site is located at http://www.kjo.or.kr/-
dc.relation.ispartofThe Korean Journal of Orthodonticsen_US
dc.rightsThis work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.-
dc.subjectHistology-
dc.subjectOrthodontic mini-implant-
dc.subjectStability-
dc.subjectSurface treatment-
dc.titleBiologic stability of plasma ion-implanted miniscrewsen_US
dc.typeArticleen_US
dc.identifier.emailJung, HS: hsjung@hku.hken_US
dc.identifier.authorityJung, HS=rp01683en_US
dc.description.naturepublished_or_final_version-
dc.identifier.doi10.4041/kjod.2013.43.3.120-
dc.identifier.pmid23814706-
dc.identifier.pmcidPMC3694203-
dc.identifier.scopuseid_2-s2.0-84879437852-
dc.identifier.hkuros215725en_US
dc.identifier.volume43en_US
dc.identifier.issue3en_US
dc.identifier.spage120en_US
dc.identifier.epage126en_US
dc.identifier.isiWOS:000320910000003-
dc.publisher.placeKorea, Republic of-
dc.identifier.issnl1225-5610-

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