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Article: Enhanced tunneling electroresistance in multiferroic tunnel junctions due to the reversible modulation of orbitals overlap

TitleEnhanced tunneling electroresistance in multiferroic tunnel junctions due to the reversible modulation of orbitals overlap
Authors
Jiang, LTao, LYang, BSWang, JHan, XF
Issue Date2016
PublisherAmerican Institute of Physics. The Journal's web site is located at http://apl.aip.org/
Citation
Applied Physics Letters, 2016, v. 109 n. 19, article no. 192902, p. 1-6 How to Cite?
DOI: http://dx.doi.org/10.1063/1.4967379
Persistent Identifierhttp://hdl.handle.net/10722/238704
ISSN
0003-6951
2021 Impact Factor: 3.971
2020 SCImago Journal Rankings: 1.182
ISI Accession Number ID
WOS:000387999600038

 

DC FieldValueLanguage
dc.contributor.authorJiang, L-
dc.contributor.authorTao, L-
dc.contributor.authorYang, BS-
dc.contributor.authorWang, J-
dc.contributor.authorHan, XF-
dc.date.accessioned2017-02-20T01:24:58Z-
dc.date.available2017-02-20T01:24:58Z-
dc.date.issued2016-
dc.identifier.citationApplied Physics Letters, 2016, v. 109 n. 19, article no. 192902, p. 1-6-
dc.identifier.issn0003-6951-
dc.identifier.urihttp://hdl.handle.net/10722/238704-
dc.languageeng-
dc.publisherAmerican Institute of Physics. The Journal's web site is located at http://apl.aip.org/-
dc.relation.ispartofApplied Physics Letters-
dc.rightsThis article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Applied Physics Letters, 2016, v. 109 n. 19, article no. 192902, p. 1-6 and may be found at https://doi.org/10.1063/1.4967379-
dc.titleEnhanced tunneling electroresistance in multiferroic tunnel junctions due to the reversible modulation of orbitals overlap-
dc.typeArticle-
dc.identifier.emailJiang, L: lnjiang@hku.hk-
dc.identifier.emailTao, L: lltao@hku.hk-
dc.identifier.emailWang, J: jianwang@hku.hk-
dc.identifier.authorityWang, J=rp00799-
dc.description.naturepublished_or_final_version-
dc.identifier.doi10.1063/1.4967379-
dc.identifier.scopuseid_2-s2.0-84994890361-
dc.identifier.hkuros271323-
dc.identifier.volume109-
dc.identifier.issue19-
dc.identifier.spagearticle no. 192902, p. 1-
dc.identifier.epagearticle no. 192902, p. 6-
dc.identifier.isiWOS:000387999600038-
dc.publisher.placeUnited States-
dc.identifier.issnl0003-6951-

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