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Article: Asymmetric Hysteresis Modeling and Compensation Approach for Nanomanipulation System Motion Control considering Working-range Effect

TitleAsymmetric Hysteresis Modeling and Compensation Approach for Nanomanipulation System Motion Control considering Working-range Effect
Authors
KeywordsAsymmetric hysteresis
Atomic force microscope (AFM)
Compensation
Nanomanipulation
Unparallel Prandtl-Ishlinskii (UPI)
Issue Date2017
PublisherIEEE. The Journal's web site is located at http://ieeexplore.ieee.org/xpl/RecentIssue.jsp?punumber=41
Citation
IEEE Transactions on Industrial Electronics, 2017, v. 64 n. 7, p. 5513-5523 How to Cite?
AbstractAtomic force microscope (AFM) has been defined as the one of the most powerful instruments to explore micro/nano-world in various fields. To lower imaging noise, AFMs are commonly equipped with open-loop nanopositioners (scanners). However, the hysteretic effect of the AFM positioners is a dominate factor that increases the position error during AFM based manipulations. To reduce hysteresis, inverse compensation approach is an effective solution. Normally, one compensator is designed for the manipulation task with maximum working-range, which may not be efficient enough for maintaining uniform accuracy for tasks with different working-ranges. The objective of this study is to develop a working-range adapted compensator to tackle this challenge. First, a generalized method that can precisely model various types of hysteresis is required. To fulfill this, a flexible Prandtl-Ishlinskii (PI) type model, named extended unparallel PI (EUPI) model, is employed. Based on this model, an implicit hysteresis compensation approach is developed, and its stability condition and control gain optimization approach are proposed. Combining the modeling and compensation approaches, a working-range adapted hysteresis compensator is finally established. Experimental results demonstrate that the mean control errors of the compensator are uniformly below 5% in different working-ranges.
Persistent Identifierhttp://hdl.handle.net/10722/240328
ISSN
2019 Impact Factor: 7.515
2015 SCImago Journal Rankings: 3.285
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorSun, Z-
dc.contributor.authorSong, B-
dc.contributor.authorXi, N-
dc.contributor.authorYang, R-
dc.contributor.authorHao, L-
dc.contributor.authorYang, Y-
dc.contributor.authorChen, L-
dc.date.accessioned2017-04-19T08:22:57Z-
dc.date.available2017-04-19T08:22:57Z-
dc.date.issued2017-
dc.identifier.citationIEEE Transactions on Industrial Electronics, 2017, v. 64 n. 7, p. 5513-5523-
dc.identifier.issn0278-0046-
dc.identifier.urihttp://hdl.handle.net/10722/240328-
dc.description.abstractAtomic force microscope (AFM) has been defined as the one of the most powerful instruments to explore micro/nano-world in various fields. To lower imaging noise, AFMs are commonly equipped with open-loop nanopositioners (scanners). However, the hysteretic effect of the AFM positioners is a dominate factor that increases the position error during AFM based manipulations. To reduce hysteresis, inverse compensation approach is an effective solution. Normally, one compensator is designed for the manipulation task with maximum working-range, which may not be efficient enough for maintaining uniform accuracy for tasks with different working-ranges. The objective of this study is to develop a working-range adapted compensator to tackle this challenge. First, a generalized method that can precisely model various types of hysteresis is required. To fulfill this, a flexible Prandtl-Ishlinskii (PI) type model, named extended unparallel PI (EUPI) model, is employed. Based on this model, an implicit hysteresis compensation approach is developed, and its stability condition and control gain optimization approach are proposed. Combining the modeling and compensation approaches, a working-range adapted hysteresis compensator is finally established. Experimental results demonstrate that the mean control errors of the compensator are uniformly below 5% in different working-ranges.-
dc.languageeng-
dc.publisherIEEE. The Journal's web site is located at http://ieeexplore.ieee.org/xpl/RecentIssue.jsp?punumber=41-
dc.relation.ispartofIEEE Transactions on Industrial Electronics-
dc.rightsIEEE Transactions on Industrial Electronics. Copyright © IEEE.-
dc.subjectAsymmetric hysteresis-
dc.subjectAtomic force microscope (AFM)-
dc.subjectCompensation-
dc.subjectNanomanipulation-
dc.subjectUnparallel Prandtl-Ishlinskii (UPI)-
dc.titleAsymmetric Hysteresis Modeling and Compensation Approach for Nanomanipulation System Motion Control considering Working-range Effect-
dc.typeArticle-
dc.identifier.emailSun, Z: sunzy@hku.hk-
dc.identifier.emailXi, N: xining@hku.hk-
dc.identifier.authorityXi, N=rp02044-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1109/TIE.2017.2677300-
dc.identifier.scopuseid_2-s2.0-85028753220-
dc.identifier.hkuros271898-
dc.identifier.volume64-
dc.identifier.issue7-
dc.identifier.spage5513-
dc.identifier.epage5523-
dc.identifier.isiWOS:000403011200027-
dc.publisher.placeUnited States-

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