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Conference Paper: Placement sensitivity to aberration in optical imaging

TitlePlacement sensitivity to aberration in optical imaging
Authors
Mak, GYHLam, EYMWong, AKK
KeywordsComputers
Circuits
Issue Date2003
PublisherIEEE.
Citation
The 2003 IEEE Conference on Electron Devices and Solid-State Circuits, Hong Kong, China, 16-18 December 2003, p. 475-478 How to Cite?
DOI: http://dx.doi.org/10.1109/EDSSC.2003.1283576
AbstractTheories are developed to quantify the shift of image intensity extremum (/spl Delta/x) due to aberration. The theory on real, one-dimensional mask spectrum has been extended to complex, two-dimensional mask spectrum under coherent and partially coherent imaging. Verification of the formulae was performed on alternating phase-shifting mask (PSM) and contact array. Balanced third-order coma was used to illustrate the validity of the theories. It is found that the image shift due to aberration of alternating PSM decreases when the partial coherence factor increases. In general, the theories can be applied to any mask spectra and aberration functions.
Persistent Identifierhttp://hdl.handle.net/10722/46406

 

DC FieldValueLanguage
dc.contributor.authorMak, GYHen_HK
dc.contributor.authorLam, EYMen_HK
dc.contributor.authorWong, AKKen_HK
dc.date.accessioned2007-10-30T06:49:11Z-
dc.date.available2007-10-30T06:49:11Z-
dc.date.issued2003en_HK
dc.identifier.citationThe 2003 IEEE Conference on Electron Devices and Solid-State Circuits, Hong Kong, China, 16-18 December 2003, p. 475-478en_HK
dc.identifier.urihttp://hdl.handle.net/10722/46406-
dc.description.abstractTheories are developed to quantify the shift of image intensity extremum (/spl Delta/x) due to aberration. The theory on real, one-dimensional mask spectrum has been extended to complex, two-dimensional mask spectrum under coherent and partially coherent imaging. Verification of the formulae was performed on alternating phase-shifting mask (PSM) and contact array. Balanced third-order coma was used to illustrate the validity of the theories. It is found that the image shift due to aberration of alternating PSM decreases when the partial coherence factor increases. In general, the theories can be applied to any mask spectra and aberration functions.en_HK
dc.format.extent201990 bytes-
dc.format.extent41662 bytes-
dc.format.extent5278 bytes-
dc.format.extent4084 bytes-
dc.format.mimetypeapplication/pdf-
dc.format.mimetypeimage/tiff-
dc.format.mimetypetext/plain-
dc.format.mimetypetext/plain-
dc.languageengen_HK
dc.publisherIEEE.en_HK
dc.relation.ispartofIEEE Conference on Electron Devices and Solid-State Circuits-
dc.rights©2003 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.-
dc.subjectComputersen_HK
dc.subjectCircuitsen_HK
dc.titlePlacement sensitivity to aberration in optical imagingen_HK
dc.typeConference_Paperen_HK
dc.description.naturepublished_or_final_versionen_HK
dc.identifier.doi10.1109/EDSSC.2003.1283576en_HK
dc.identifier.scopuseid_2-s2.0-3843133310-
dc.identifier.hkuros88833-

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