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Article: A-site disorder induces magnetoresistance in Y and Sr co-doped La2/3-xYxCa1/3-ySryMnO3

TitleA-site disorder induces magnetoresistance in Y and Sr co-doped La2/3-xYxCa1/3-ySryMnO3
Authors
Cai, HLWu, XSWang, FZHu, AJiang, SSGao, JTan, WS
KeywordsMagnetoresistance
Rietveld refine method
Small polaron
Issue Date2005
PublisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/jallcom
Citation
Journal of Alloys and Compounds, 2005, v. 397 n. 1-2, p. 250-254 How to Cite?
DOI: http://dx.doi.org/10.1016/j.jallcom.2004.11.068
Persistent Identifierhttp://hdl.handle.net/10722/80387
ISSN
0925-8388
2021 Impact Factor: 6.371
2020 SCImago Journal Rankings: 1.112
ISI Accession Number ID
WOS:000230067900045

 

DC FieldValueLanguage
dc.contributor.authorCai, HLen_HK
dc.contributor.authorWu, XSen_HK
dc.contributor.authorWang, FZen_HK
dc.contributor.authorHu, Aen_HK
dc.contributor.authorJiang, SSen_HK
dc.contributor.authorGao, Jen_HK
dc.contributor.authorTan, WSen_HK
dc.date.accessioned2010-09-06T08:05:54Z-
dc.date.available2010-09-06T08:05:54Z-
dc.date.issued2005en_HK
dc.identifier.citationJournal of Alloys and Compounds, 2005, v. 397 n. 1-2, p. 250-254en_HK
dc.identifier.issn0925-8388en_HK
dc.identifier.urihttp://hdl.handle.net/10722/80387-
dc.languageengen_HK
dc.publisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/jallcomen_HK
dc.relation.ispartofJournal of Alloys and Compoundsen_HK
dc.rightsJournal of Alloys and Compounds. Copyright © Elsevier BV.en_HK
dc.subjectMagnetoresistance-
dc.subjectRietveld refine method-
dc.subjectSmall polaron-
dc.titleA-site disorder induces magnetoresistance in Y and Sr co-doped La2/3-xYxCa1/3-ySryMnO3en_HK
dc.typeArticleen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0925-8388&volume=397&spage=250&epage=254&date=2005&atitle=A-site+disorder+induces+magnetoresistance+in+Y+and+Sr+co-doped+La2/3-xYxCa1/3-ySryMnO3en_HK
dc.identifier.emailGao, J: jugao@hku.hken_HK
dc.identifier.authorityGao, J=rp00699en_HK
dc.identifier.doi10.1016/j.jallcom.2004.11.068-
dc.identifier.scopuseid_2-s2.0-19744365735-
dc.identifier.hkuros98460en_HK
dc.identifier.isiWOS:000230067900045-
dc.identifier.issnl0925-8388-

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