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Conference Paper: Joint optimization of source, mask, and pupil in optical lithography
Title | Joint optimization of source, mask, and pupil in optical lithography |
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Authors | |
Keywords | Computational lithography Mask topography effects Source mask optimization Spherical aberration Usable depth of focus |
Issue Date | 2014 |
Publisher | S P I E - International Society for Optical Engineering. The Journal's web site is located at http://spie.org/x1848.xml?WT.svl=mddp2 |
Citation | Conference 9052 - The 27th Optical Microlithography (OM) Conference, San Jose, California, USA , 25-27 February 2014. In Proceedings of SPIE, 2014, v. 9052 , p. article no. 90520S How to Cite? |
Abstract | Mask topography effects need to be taken into consideration for more advanced resolution enhancement techniques in optical lithography. However, rigorous 3D mask model achieves high accuracy at a large computational cost. This work develops a combined source, mask and pupil optimization (SMPO) approach by taking advantage of the fact that pupil phase manipulation is capable of partially compensating for mask topography effects. We first design the pupil wavefront function by incorporating primary and secondary spherical aberration through the coefficients of the Zernike polynomials, and achieve optimal source-mask pair under the condition of aberrated pupil. Evaluations against conventional source mask optimization (SMO) without incorporating pupil aberrations show that SMPO provides improved performance in terms of pattern fidelity and process window sizes. |
Persistent Identifier | http://hdl.handle.net/10722/201228 |
ISBN | |
ISSN | 2023 SCImago Journal Rankings: 0.152 |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | Li, J | en_US |
dc.contributor.author | Lam, EYM | en_US |
dc.date.accessioned | 2014-08-21T07:18:17Z | - |
dc.date.available | 2014-08-21T07:18:17Z | - |
dc.date.issued | 2014 | en_US |
dc.identifier.citation | Conference 9052 - The 27th Optical Microlithography (OM) Conference, San Jose, California, USA , 25-27 February 2014. In Proceedings of SPIE, 2014, v. 9052 , p. article no. 90520S | en_US |
dc.identifier.isbn | 9780819499752 | - |
dc.identifier.issn | 0277-786X | - |
dc.identifier.uri | http://hdl.handle.net/10722/201228 | - |
dc.description.abstract | Mask topography effects need to be taken into consideration for more advanced resolution enhancement techniques in optical lithography. However, rigorous 3D mask model achieves high accuracy at a large computational cost. This work develops a combined source, mask and pupil optimization (SMPO) approach by taking advantage of the fact that pupil phase manipulation is capable of partially compensating for mask topography effects. We first design the pupil wavefront function by incorporating primary and secondary spherical aberration through the coefficients of the Zernike polynomials, and achieve optimal source-mask pair under the condition of aberrated pupil. Evaluations against conventional source mask optimization (SMO) without incorporating pupil aberrations show that SMPO provides improved performance in terms of pattern fidelity and process window sizes. | - |
dc.language | eng | en_US |
dc.publisher | S P I E - International Society for Optical Engineering. The Journal's web site is located at http://spie.org/x1848.xml?WT.svl=mddp2 | - |
dc.relation.ispartof | Proceedings of SPIE - International Society for Optical Engineering | en_US |
dc.rights | Copyright 2014 Society of Photo‑Optical Instrumentation Engineers (SPIE). One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this publication for a fee or for commercial purposes, and modification of the contents of the publication are prohibited. This article is available online at https://doi.org/10.1117/12.2045739 | - |
dc.subject | Computational lithography | - |
dc.subject | Mask topography effects | - |
dc.subject | Source mask optimization | - |
dc.subject | Spherical aberration | - |
dc.subject | Usable depth of focus | - |
dc.title | Joint optimization of source, mask, and pupil in optical lithography | en_US |
dc.type | Conference_Paper | en_US |
dc.identifier.email | Lam, EYM: elam@eee.hku.hk | en_US |
dc.identifier.authority | Lam, EYM=rp00131 | en_US |
dc.description.nature | published_or_final_version | - |
dc.identifier.doi | 10.1117/12.2045739 | - |
dc.identifier.scopus | eid_2-s2.0-84901745687 | - |
dc.identifier.hkuros | 233697 | en_US |
dc.identifier.volume | 9052 | - |
dc.identifier.spage | article no. 90520S | - |
dc.identifier.epage | article no. 90520S | - |
dc.identifier.isi | WOS:000337142800023 | - |
dc.publisher.place | United States | - |
dc.identifier.issnl | 0277-786X | - |