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Article: Graphitic carbon film formation under Ni templates by radio-frequency sputtering for transparent electrode applications
Title | Graphitic carbon film formation under Ni templates by radio-frequency sputtering for transparent electrode applications |
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Authors | |
Issue Date | 2011 |
Citation | Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 2011, v. 29, n. 6, article no. 061202 How to Cite? |
Abstract | An alternate approach to the preparation of transfer-free graphitic carbon films is proposed in this paper. Using a standard radio-frequency sputtering system and a high-temperature annealing procedure, graphitic carbon films are prepared under Ni templates. The results demonstrate that carbon precipitation occurs at both Ni template interfaces. With repeated annealing procedures at 1100 °C, a sheet resistance of 1.36 × 10 Ω/□ can be achieved. Selective carbon film deposition has also been developed via pattern formation on the Ni templates. The results indicate the potential application of this method to transparent electrode formation. © 2011 American Vacuum Society. 4 |
Persistent Identifier | http://hdl.handle.net/10722/298546 |
ISSN | 2023 Impact Factor: 1.5 2023 SCImago Journal Rankings: 0.328 |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | Lin, Meng Yu | - |
dc.contributor.author | Sheng, Yung Shuan | - |
dc.contributor.author | Chen, Shu Han | - |
dc.contributor.author | Su, Ching Yuan | - |
dc.contributor.author | Li, Lain Jong | - |
dc.contributor.author | Lin, Shih Yen | - |
dc.date.accessioned | 2021-04-08T03:08:44Z | - |
dc.date.available | 2021-04-08T03:08:44Z | - |
dc.date.issued | 2011 | - |
dc.identifier.citation | Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 2011, v. 29, n. 6, article no. 061202 | - |
dc.identifier.issn | 2166-2746 | - |
dc.identifier.uri | http://hdl.handle.net/10722/298546 | - |
dc.description.abstract | An alternate approach to the preparation of transfer-free graphitic carbon films is proposed in this paper. Using a standard radio-frequency sputtering system and a high-temperature annealing procedure, graphitic carbon films are prepared under Ni templates. The results demonstrate that carbon precipitation occurs at both Ni template interfaces. With repeated annealing procedures at 1100 °C, a sheet resistance of 1.36 × 10 Ω/□ can be achieved. Selective carbon film deposition has also been developed via pattern formation on the Ni templates. The results indicate the potential application of this method to transparent electrode formation. © 2011 American Vacuum Society. 4 | - |
dc.language | eng | - |
dc.relation.ispartof | Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics | - |
dc.title | Graphitic carbon film formation under Ni templates by radio-frequency sputtering for transparent electrode applications | - |
dc.type | Article | - |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1116/1.3646481 | - |
dc.identifier.scopus | eid_2-s2.0-84255190047 | - |
dc.identifier.volume | 29 | - |
dc.identifier.issue | 6 | - |
dc.identifier.spage | article no. 061202 | - |
dc.identifier.epage | article no. 061202 | - |
dc.identifier.eissn | 2166-2754 | - |
dc.identifier.isi | WOS:000298538800106 | - |
dc.identifier.issnl | 2166-2746 | - |