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Title | Author(s) | Issue Date | |
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Leakage mechanism in Cu damascene structure with methylsilane-doped low-k CVD oxide as intermetal dielectric Journal:IEEE Electron Device Letters | 2001 |
Title | Author(s) | Issue Date | |
---|---|---|---|
Leakage mechanism in Cu damascene structure with methylsilane-doped low-k CVD oxide as intermetal dielectric Journal:IEEE Electron Device Letters | 2001 |