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	Title	Author(s)	Issue Date
	A degradable polycyclic cross-linker for UV-curing nanoimprint lithography Journal:Journal of Materials Chemistry C	Hu, X Yang, T Gu, RH Cui, YS Yuan, CS Ge, HX Wu, W Li, W Chen, YF	2014
	Double transfer UV-curing nanoimprint lithography Journal:Nanotechnology	Shen, YM Yao, L Li, ZW Kou, JL Cui, YS Bian, J Yuan, CS Ge, HX Li, W Wu, W Chen, YF	2013

Showing results 1 to 2 of 2