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| Title | Author(s) | Issue Date | |
|---|---|---|---|
Wet etch clean-up of plasma damage for 1.68 kV breakdown in NiO/β-Ga2O3 chlorine-etched PN diodes Journal:Journal of Vacuum Science & Technology A | 1-May-2025 |
| Title | Author(s) | Issue Date | |
|---|---|---|---|
Wet etch clean-up of plasma damage for 1.68 kV breakdown in NiO/β-Ga2O3 chlorine-etched PN diodes Journal:Journal of Vacuum Science & Technology A | 1-May-2025 |