Showing results 1 to 2 of 2
| Title | Author(s) | Issue Date | |
|---|---|---|---|
Characterization of linewidth variation on 248- and 193-nm exposure tools Proceeding/Conference:Proceedings of SPIE | 2001 | ||
Optimum mask and source patterns to print a given shape Journal:Journal of Microlithography, Microfabrication, and Microsystems | 2002 |