Showing results 1 to 4 of 4
| Title | Author(s) | Issue Date | |
|---|---|---|---|
| 2008 | |||
Impact of local structural and electrical properties of grain boundaries in polycrystalline HfO2 on reliability of SiOx interfacial layer Journal:Microelectronics Reliability | 2014 | ||
Nanoscale electrical and physical study of polycrystalline high-κ dielectrics and proposed reliability enhancement techniques Proceeding/Conference:IEEE International Reliability Physics Symposium Proceedings | 2011 | ||
Nanoscale physical analysis of localized breakdown events in HfO<inf>2</inf>/SiO<inf>X</inf> dielectric stacks: A correlation study of STM induced BD with C-AFM and TEM Proceeding/Conference:Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA | 2012 |