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Article: Treatment of inflammatory facial acne with 1,450-nm diode laser in type IV to v Asian skin using an optimal combination of laser parameters

TitleTreatment of inflammatory facial acne with 1,450-nm diode laser in type IV to v Asian skin using an optimal combination of laser parameters
Authors
KeywordsAcne Vulgaris - complications - radiotherapy
Asian Continental Ancestry Group
Face
Hyperpigmentation - etiology - prevention and control
Laser Therapy - adverse effects
Issue Date2009
PublisherWiley-Blackwell. The Journal's web site is located at http://www.wiley.com/bw/journal.asp?ref=1076-0512
Citation
Dermatologic Surgery, 2009, v. 35 n. 4, p. 593-600 How to Cite?
AbstractBackground The 1,450-nm diode laser is effective for the treatment of inflammatory acne, but there is a significant risk of postinflammatory hyperpigmentation (PIH) in Asian skin. Objective To determine whether lower fluence and shorter cooling duration of the 1,450-nm diode laser improve acne effectively with minimal PIH in darker skin. Materials and Methods Twenty-six subjects (skin phototypes IV-V) with inflammatory facial acne received four treatments using the 1,450-nm diode laser with 6-mm spot size 3 to 4 weeks apart. We used three passes with a fluence of 8 J/cm2 with dynamic cooling of 25 ms to minimize PIH. Serial blinded assessment of acne lesion counts and sebum measurement were evaluated before and up to 6 months after treatment. Results Four weeks and 6 months after the last treatment, reduction of mean acne lesions was 29% (p<.01) and 40% (p<.03), respectively, from baseline in the group with moderate acne. Significant improvements of sebum production were noted. Four episodes of temporary PIH (3.8%) were observed out of all treatment sessions. Conclusion Use of multiple passes of a 1,450-nm diode laser with lower fluence and shorter dynamic cooling device retains its therapeutic efficacy with substantial reduction of PIH for moderate acne. The nonablative 1,450-nm diode laser was loaned for this study by Candela, Corp., Wayland, Massachusetts. © 2009 by the American Society for Dermatologic Surgery, Inc.
Persistent Identifierhttp://hdl.handle.net/10722/139458
ISSN
2023 Impact Factor: 2.5
2023 SCImago Journal Rankings: 0.695
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorYeung, CKen_HK
dc.contributor.authorShek, SYen_HK
dc.contributor.authorYu, CSen_HK
dc.contributor.authorKono, Ten_HK
dc.contributor.authorChan, HHen_HK
dc.date.accessioned2011-09-23T05:50:18Z-
dc.date.available2011-09-23T05:50:18Z-
dc.date.issued2009en_HK
dc.identifier.citationDermatologic Surgery, 2009, v. 35 n. 4, p. 593-600en_HK
dc.identifier.issn1076-0512en_HK
dc.identifier.urihttp://hdl.handle.net/10722/139458-
dc.description.abstractBackground The 1,450-nm diode laser is effective for the treatment of inflammatory acne, but there is a significant risk of postinflammatory hyperpigmentation (PIH) in Asian skin. Objective To determine whether lower fluence and shorter cooling duration of the 1,450-nm diode laser improve acne effectively with minimal PIH in darker skin. Materials and Methods Twenty-six subjects (skin phototypes IV-V) with inflammatory facial acne received four treatments using the 1,450-nm diode laser with 6-mm spot size 3 to 4 weeks apart. We used three passes with a fluence of 8 J/cm2 with dynamic cooling of 25 ms to minimize PIH. Serial blinded assessment of acne lesion counts and sebum measurement were evaluated before and up to 6 months after treatment. Results Four weeks and 6 months after the last treatment, reduction of mean acne lesions was 29% (p<.01) and 40% (p<.03), respectively, from baseline in the group with moderate acne. Significant improvements of sebum production were noted. Four episodes of temporary PIH (3.8%) were observed out of all treatment sessions. Conclusion Use of multiple passes of a 1,450-nm diode laser with lower fluence and shorter dynamic cooling device retains its therapeutic efficacy with substantial reduction of PIH for moderate acne. The nonablative 1,450-nm diode laser was loaned for this study by Candela, Corp., Wayland, Massachusetts. © 2009 by the American Society for Dermatologic Surgery, Inc.en_HK
dc.languageengen_US
dc.publisherWiley-Blackwell. The Journal's web site is located at http://www.wiley.com/bw/journal.asp?ref=1076-0512-
dc.relation.ispartofDermatologic Surgeryen_HK
dc.rightsThe definitive version is available at www3.interscience.wiley.com-
dc.subjectAcne Vulgaris - complications - radiotherapy-
dc.subjectAsian Continental Ancestry Group-
dc.subjectFace-
dc.subjectHyperpigmentation - etiology - prevention and control-
dc.subjectLaser Therapy - adverse effects-
dc.titleTreatment of inflammatory facial acne with 1,450-nm diode laser in type IV to v Asian skin using an optimal combination of laser parametersen_HK
dc.typeArticleen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=1076-0512&volume=35&issue=4&spage=593&epage=600&date=2009&atitle=Treatment+of+inflammatory+facial+acne+with+1,450-nm+diode+laser+in+type+IV+to+V+Asian+skin+using+an+optimal+combination+of+laser+parameters-
dc.identifier.emailYu, CS: carolsyu@hku.hken_HK
dc.identifier.authorityYu, CS=rp00305en_HK
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1111/j.1524-4725.2009.01097.xen_HK
dc.identifier.pmid19309346-
dc.identifier.scopuseid_2-s2.0-64349112943en_HK
dc.identifier.hkuros164695en_US
dc.identifier.hkuros194048en_US
dc.identifier.hkuros194051en_US
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-64349112943&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume35en_HK
dc.identifier.issue4en_HK
dc.identifier.spage593en_HK
dc.identifier.epage600en_HK
dc.identifier.isiWOS:000264955700004-
dc.publisher.placeUnited Statesen_HK
dc.identifier.scopusauthoridYeung, CK=7201354123en_HK
dc.identifier.scopusauthoridShek, SY=35995822400en_HK
dc.identifier.scopusauthoridYu, CS=8856262400en_HK
dc.identifier.scopusauthoridKono, T=26643566000en_HK
dc.identifier.scopusauthoridChan, HH=24555248900en_HK
dc.identifier.citeulike4298189-
dc.identifier.issnl1076-0512-

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