File Download
There are no files associated with this item.
Links for fulltext
(May Require Subscription)
- Publisher Website: 10.1111/j.1524-4725.2009.01097.x
- Scopus: eid_2-s2.0-64349112943
- PMID: 19309346
- WOS: WOS:000264955700004
- Find via
Supplementary
- Citations:
- Appears in Collections:
Article: Treatment of inflammatory facial acne with 1,450-nm diode laser in type IV to v Asian skin using an optimal combination of laser parameters
Title | Treatment of inflammatory facial acne with 1,450-nm diode laser in type IV to v Asian skin using an optimal combination of laser parameters |
---|---|
Authors | |
Keywords | Acne Vulgaris - complications - radiotherapy Asian Continental Ancestry Group Face Hyperpigmentation - etiology - prevention and control Laser Therapy - adverse effects |
Issue Date | 2009 |
Publisher | Wiley-Blackwell. The Journal's web site is located at http://www.wiley.com/bw/journal.asp?ref=1076-0512 |
Citation | Dermatologic Surgery, 2009, v. 35 n. 4, p. 593-600 How to Cite? |
Abstract | Background The 1,450-nm diode laser is effective for the treatment of inflammatory acne, but there is a significant risk of postinflammatory hyperpigmentation (PIH) in Asian skin. Objective To determine whether lower fluence and shorter cooling duration of the 1,450-nm diode laser improve acne effectively with minimal PIH in darker skin. Materials and Methods Twenty-six subjects (skin phototypes IV-V) with inflammatory facial acne received four treatments using the 1,450-nm diode laser with 6-mm spot size 3 to 4 weeks apart. We used three passes with a fluence of 8 J/cm2 with dynamic cooling of 25 ms to minimize PIH. Serial blinded assessment of acne lesion counts and sebum measurement were evaluated before and up to 6 months after treatment. Results Four weeks and 6 months after the last treatment, reduction of mean acne lesions was 29% (p<.01) and 40% (p<.03), respectively, from baseline in the group with moderate acne. Significant improvements of sebum production were noted. Four episodes of temporary PIH (3.8%) were observed out of all treatment sessions. Conclusion Use of multiple passes of a 1,450-nm diode laser with lower fluence and shorter dynamic cooling device retains its therapeutic efficacy with substantial reduction of PIH for moderate acne. The nonablative 1,450-nm diode laser was loaned for this study by Candela, Corp., Wayland, Massachusetts. © 2009 by the American Society for Dermatologic Surgery, Inc. |
Persistent Identifier | http://hdl.handle.net/10722/139458 |
ISSN | 2023 Impact Factor: 2.5 2023 SCImago Journal Rankings: 0.695 |
ISI Accession Number ID | |
References |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Yeung, CK | en_HK |
dc.contributor.author | Shek, SY | en_HK |
dc.contributor.author | Yu, CS | en_HK |
dc.contributor.author | Kono, T | en_HK |
dc.contributor.author | Chan, HH | en_HK |
dc.date.accessioned | 2011-09-23T05:50:18Z | - |
dc.date.available | 2011-09-23T05:50:18Z | - |
dc.date.issued | 2009 | en_HK |
dc.identifier.citation | Dermatologic Surgery, 2009, v. 35 n. 4, p. 593-600 | en_HK |
dc.identifier.issn | 1076-0512 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/139458 | - |
dc.description.abstract | Background The 1,450-nm diode laser is effective for the treatment of inflammatory acne, but there is a significant risk of postinflammatory hyperpigmentation (PIH) in Asian skin. Objective To determine whether lower fluence and shorter cooling duration of the 1,450-nm diode laser improve acne effectively with minimal PIH in darker skin. Materials and Methods Twenty-six subjects (skin phototypes IV-V) with inflammatory facial acne received four treatments using the 1,450-nm diode laser with 6-mm spot size 3 to 4 weeks apart. We used three passes with a fluence of 8 J/cm2 with dynamic cooling of 25 ms to minimize PIH. Serial blinded assessment of acne lesion counts and sebum measurement were evaluated before and up to 6 months after treatment. Results Four weeks and 6 months after the last treatment, reduction of mean acne lesions was 29% (p<.01) and 40% (p<.03), respectively, from baseline in the group with moderate acne. Significant improvements of sebum production were noted. Four episodes of temporary PIH (3.8%) were observed out of all treatment sessions. Conclusion Use of multiple passes of a 1,450-nm diode laser with lower fluence and shorter dynamic cooling device retains its therapeutic efficacy with substantial reduction of PIH for moderate acne. The nonablative 1,450-nm diode laser was loaned for this study by Candela, Corp., Wayland, Massachusetts. © 2009 by the American Society for Dermatologic Surgery, Inc. | en_HK |
dc.language | eng | en_US |
dc.publisher | Wiley-Blackwell. The Journal's web site is located at http://www.wiley.com/bw/journal.asp?ref=1076-0512 | - |
dc.relation.ispartof | Dermatologic Surgery | en_HK |
dc.rights | The definitive version is available at www3.interscience.wiley.com | - |
dc.subject | Acne Vulgaris - complications - radiotherapy | - |
dc.subject | Asian Continental Ancestry Group | - |
dc.subject | Face | - |
dc.subject | Hyperpigmentation - etiology - prevention and control | - |
dc.subject | Laser Therapy - adverse effects | - |
dc.title | Treatment of inflammatory facial acne with 1,450-nm diode laser in type IV to v Asian skin using an optimal combination of laser parameters | en_HK |
dc.type | Article | en_HK |
dc.identifier.openurl | http://library.hku.hk:4550/resserv?sid=HKU:IR&issn=1076-0512&volume=35&issue=4&spage=593&epage=600&date=2009&atitle=Treatment+of+inflammatory+facial+acne+with+1,450-nm+diode+laser+in+type+IV+to+V+Asian+skin+using+an+optimal+combination+of+laser+parameters | - |
dc.identifier.email | Yu, CS: carolsyu@hku.hk | en_HK |
dc.identifier.authority | Yu, CS=rp00305 | en_HK |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1111/j.1524-4725.2009.01097.x | en_HK |
dc.identifier.pmid | 19309346 | - |
dc.identifier.scopus | eid_2-s2.0-64349112943 | en_HK |
dc.identifier.hkuros | 164695 | en_US |
dc.identifier.hkuros | 194048 | en_US |
dc.identifier.hkuros | 194051 | en_US |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-64349112943&selection=ref&src=s&origin=recordpage | en_HK |
dc.identifier.volume | 35 | en_HK |
dc.identifier.issue | 4 | en_HK |
dc.identifier.spage | 593 | en_HK |
dc.identifier.epage | 600 | en_HK |
dc.identifier.isi | WOS:000264955700004 | - |
dc.publisher.place | United States | en_HK |
dc.identifier.scopusauthorid | Yeung, CK=7201354123 | en_HK |
dc.identifier.scopusauthorid | Shek, SY=35995822400 | en_HK |
dc.identifier.scopusauthorid | Yu, CS=8856262400 | en_HK |
dc.identifier.scopusauthorid | Kono, T=26643566000 | en_HK |
dc.identifier.scopusauthorid | Chan, HH=24555248900 | en_HK |
dc.identifier.citeulike | 4298189 | - |
dc.identifier.issnl | 1076-0512 | - |