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Conference Paper: Large-area metal grid ultraviolet filter fabricated by nanoimprint lithography

TitleLarge-area metal grid ultraviolet filter fabricated by nanoimprint lithography
Authors
KeywordsUltraviolet Lasers
Issue Date2007
Citation
Conference On Lasers And Electro-Optics, 2007, Cleo 2007, 2007 How to Cite?
AbstractFor the first time, a wafer-scale metal grid UV filter is fabricated by nanoimprint lithography and demonstrates cut-off wavelength of 350nm, peak transmission of 27% at 285nm and rejection ratio of 20dB at visible wavelength. © 2007 Optical Society of America.
Persistent Identifierhttp://hdl.handle.net/10722/145467
References

 

DC FieldValueLanguage
dc.contributor.authorLi, WDen_HK
dc.contributor.authorChou, SYen_HK
dc.date.accessioned2012-02-23T12:10:51Z-
dc.date.available2012-02-23T12:10:51Z-
dc.date.issued2007en_HK
dc.identifier.citationConference On Lasers And Electro-Optics, 2007, Cleo 2007, 2007en_HK
dc.identifier.urihttp://hdl.handle.net/10722/145467-
dc.description.abstractFor the first time, a wafer-scale metal grid UV filter is fabricated by nanoimprint lithography and demonstrates cut-off wavelength of 350nm, peak transmission of 27% at 285nm and rejection ratio of 20dB at visible wavelength. © 2007 Optical Society of America.en_HK
dc.languageengen_US
dc.relation.ispartofConference on Lasers and Electro-Optics, 2007, CLEO 2007en_HK
dc.subjectUltraviolet Lasersen_US
dc.titleLarge-area metal grid ultraviolet filter fabricated by nanoimprint lithographyen_HK
dc.typeConference_Paperen_HK
dc.identifier.emailLi, WD:liwd@hku.hken_HK
dc.identifier.authorityLi, WD=rp01581en_HK
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.doi10.1109/CLEO.2007.4452830en_HK
dc.identifier.scopuseid_2-s2.0-82955217262en_HK
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-82955217262&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.scopusauthoridLi, WD=35181575900en_HK
dc.identifier.scopusauthoridChou, SY=7401538612en_HK

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