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Book Chapter: Fabrication and characterization of as doped p-type ZnO films grown by magnetron sputtering

TitleFabrication and characterization of as doped p-type ZnO films grown by magnetron sputtering
Authors
Fan, JLing, FCCXie, Z
Issue Date2011
PublisherInTech
Citation
Fabrication and characterization of as doped p-type ZnO films grown by magnetron sputtering. In Predeep, P (Ed.), Optoelectronics materials and techniques, p. 393-420. Croatia: InTech, 2011 How to Cite?
Persistent Identifierhttp://hdl.handle.net/10722/145654
ISBN
9789533072760

 

DC FieldValueLanguage
dc.contributor.authorFan, Jen_US
dc.contributor.authorLing, FCCen_US
dc.contributor.authorXie, Zen_US
dc.date.accessioned2012-02-28T02:01:15Z-
dc.date.available2012-02-28T02:01:15Z-
dc.date.issued2011en_US
dc.identifier.citationFabrication and characterization of as doped p-type ZnO films grown by magnetron sputtering. In Predeep, P (Ed.), Optoelectronics materials and techniques, p. 393-420. Croatia: InTech, 2011en_US
dc.identifier.isbn9789533072760en_US
dc.identifier.urihttp://hdl.handle.net/10722/145654-
dc.languageengen_US
dc.publisherInTechen_US
dc.relation.ispartofOptoelectronics materials and techniquesen_US
dc.titleFabrication and characterization of as doped p-type ZnO films grown by magnetron sputteringen_US
dc.typeBook_Chapteren_US
dc.identifier.emailLing, FCC: ccling@hkucc.hku.hken_US
dc.identifier.authorityLing, FCC=rp00747en_US
dc.identifier.hkuros198653en_US
dc.identifier.spage393en_US
dc.identifier.epage420en_US
dc.publisher.placeCroatiaen_US
dc.customcontrol.immutableyiu 130823-

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