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Article: Formation and electrochemical behavior of Al and O plasma-implanted biodegradable Mg-Y-RE alloy
Title | Formation and electrochemical behavior of Al and O plasma-implanted biodegradable Mg-Y-RE alloy |
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Authors | |
Keywords | A. Biomaterials B. Surface C. Ion implantation D. Corrosion E. Magnesium alloys |
Issue Date | 2012 |
Publisher | Elsevier SA. The Journal's web site is located at http://www.elsevier.com/locate/matchemphys |
Citation | Materials Chemistry and Physics, 2012, v. 132 n. 1, p. 187-191 How to Cite? |
Abstract | Mg-Y-RE alloy is potentially useful in biodegradable implants but the fast degradation rate in the physiological environment restrains actual applications. In order to enhance the corrosion resistance, aluminum and oxygen ion implantation is employed to modify the surface of the Mg-Y-RE alloy. X-ray photoelectron spectroscopy (XPS) is conducted to obtain elemental depth profiles and determine chemical state changes. Electrochemical impedance spectroscopy and potentiodynamic polarization are employed to investigate the electrochemical behavior in simulated body fluids (SBF). After polarization, the corroded surface is further studied by scanning electron microscopy (SEM). The results indicate Al and O ion implantation produces an Al 2O 3-containing protection layer which improves the corrosion resistance of Mg-Y-RE alloy. After the surface treatment, localized corrosion becomes the dominant corrosion mechanism instead of general corrosion. © 2011 Elsevier B.V. |
Persistent Identifier | http://hdl.handle.net/10722/159755 |
ISSN | 2023 Impact Factor: 4.3 2023 SCImago Journal Rankings: 0.769 |
ISI Accession Number ID | |
References |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Zhao, Y | en_HK |
dc.contributor.author | Wu, G | en_HK |
dc.contributor.author | Pan, H | en_HK |
dc.contributor.author | Yeung, KWK | en_HK |
dc.contributor.author | Chu, PK | en_HK |
dc.date.accessioned | 2012-08-16T05:55:35Z | - |
dc.date.available | 2012-08-16T05:55:35Z | - |
dc.date.issued | 2012 | en_HK |
dc.identifier.citation | Materials Chemistry and Physics, 2012, v. 132 n. 1, p. 187-191 | en_HK |
dc.identifier.issn | 0254-0584 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/159755 | - |
dc.description.abstract | Mg-Y-RE alloy is potentially useful in biodegradable implants but the fast degradation rate in the physiological environment restrains actual applications. In order to enhance the corrosion resistance, aluminum and oxygen ion implantation is employed to modify the surface of the Mg-Y-RE alloy. X-ray photoelectron spectroscopy (XPS) is conducted to obtain elemental depth profiles and determine chemical state changes. Electrochemical impedance spectroscopy and potentiodynamic polarization are employed to investigate the electrochemical behavior in simulated body fluids (SBF). After polarization, the corroded surface is further studied by scanning electron microscopy (SEM). The results indicate Al and O ion implantation produces an Al 2O 3-containing protection layer which improves the corrosion resistance of Mg-Y-RE alloy. After the surface treatment, localized corrosion becomes the dominant corrosion mechanism instead of general corrosion. © 2011 Elsevier B.V. | en_HK |
dc.language | eng | en_US |
dc.publisher | Elsevier SA. The Journal's web site is located at http://www.elsevier.com/locate/matchemphys | en_HK |
dc.relation.ispartof | Materials Chemistry and Physics | en_HK |
dc.subject | A. Biomaterials | - |
dc.subject | B. Surface | - |
dc.subject | C. Ion implantation | - |
dc.subject | D. Corrosion | - |
dc.subject | E. Magnesium alloys | - |
dc.subject.mesh | Chemical state changes | - |
dc.subject.mesh | Corroded surface | - |
dc.subject.mesh | Corrosion mechanisms | - |
dc.subject.mesh | Degradation rate | - |
dc.subject.mesh | Depth profile | - |
dc.title | Formation and electrochemical behavior of Al and O plasma-implanted biodegradable Mg-Y-RE alloy | en_HK |
dc.type | Article | en_HK |
dc.identifier.email | Zhao, Y: yingzhao@hku.hk | en_HK |
dc.identifier.email | Pan, H: haobo@hku.hk | en_HK |
dc.identifier.email | Yeung, KWK: wkkyeung@hku.hk | - |
dc.identifier.email | Chu, PK: paul.chu@cityu.edu.hk | en_HK |
dc.identifier.authority | Pan, H=rp01564 | en_HK |
dc.identifier.authority | Yeung, KWK=rp00309 | en_HK |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1016/j.matchemphys.2011.11.028 | en_HK |
dc.identifier.scopus | eid_2-s2.0-84355161840 | en_HK |
dc.identifier.hkuros | 204534 | en_US |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-84355161840&selection=ref&src=s&origin=recordpage | en_HK |
dc.identifier.volume | 132 | en_HK |
dc.identifier.issue | 1 | en_HK |
dc.identifier.spage | 187 | en_HK |
dc.identifier.epage | 191 | en_HK |
dc.identifier.isi | WOS:000300865900029 | - |
dc.publisher.place | Switzerland | en_HK |
dc.identifier.scopusauthorid | Chu, PK=36040705700 | en_HK |
dc.identifier.scopusauthorid | Yeung, KWK=13309584700 | en_HK |
dc.identifier.scopusauthorid | Pan, H=7403295092 | en_HK |
dc.identifier.scopusauthorid | Wu, G=9941129500 | en_HK |
dc.identifier.scopusauthorid | Zhao, Y=36982544500 | en_HK |
dc.identifier.citeulike | 10128008 | - |
dc.identifier.issnl | 0254-0584 | - |