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- Publisher Website: 10.1021/nl102931z
- Scopus: eid_2-s2.0-77958033784
- PMID: 20839780
- WOS: WOS:000282727600080
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Article: Holey silicon as an efficient thermoelectric material
Title | Holey silicon as an efficient thermoelectric material |
---|---|
Authors | |
Keywords | Nanostructure Necking Silicon Thermal Conductivity Thermoelectric |
Issue Date | 2010 |
Publisher | American Chemical Society. The Journal's web site is located at http://pubs.acs.org/nanolett |
Citation | Nano Letters, 2010, v. 10 n. 10, p. 4279-4283 How to Cite? |
Abstract | This work investigated the thermoelectric properties of thin silicon membranes that have been decorated with high density of nanoscopic holes. These "holey silicon" (HS) structures were fabricated by either nanosphere or block-copolymer lithography, both of which are scalable for practical device application. By reducing the pitch of the hexagonal holey pattern down to 55 nm with 35% porosity, the thermal conductivity of HS is consistently reduced by 2 orders of magnitude and approaches the amorphous limit. With a ZT value of ∼0.4 at room temperature, the thermoelectric performance of HS is comparable with the best value recorded in silicon nanowire system. © 2010 American Chemical Society. |
Persistent Identifier | http://hdl.handle.net/10722/169604 |
ISSN | 2023 Impact Factor: 9.6 2023 SCImago Journal Rankings: 3.411 |
ISI Accession Number ID | |
References |
DC Field | Value | Language |
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dc.contributor.author | Tang, J | en_US |
dc.contributor.author | Wang, HT | en_US |
dc.contributor.author | Lee, DH | en_US |
dc.contributor.author | Fardy, M | en_US |
dc.contributor.author | Huo, Z | en_US |
dc.contributor.author | Russell, TP | en_US |
dc.contributor.author | Yang, P | en_US |
dc.date.accessioned | 2012-10-25T04:53:37Z | - |
dc.date.available | 2012-10-25T04:53:37Z | - |
dc.date.issued | 2010 | en_US |
dc.identifier.citation | Nano Letters, 2010, v. 10 n. 10, p. 4279-4283 | en_US |
dc.identifier.issn | 1530-6984 | en_US |
dc.identifier.uri | http://hdl.handle.net/10722/169604 | - |
dc.description.abstract | This work investigated the thermoelectric properties of thin silicon membranes that have been decorated with high density of nanoscopic holes. These "holey silicon" (HS) structures were fabricated by either nanosphere or block-copolymer lithography, both of which are scalable for practical device application. By reducing the pitch of the hexagonal holey pattern down to 55 nm with 35% porosity, the thermal conductivity of HS is consistently reduced by 2 orders of magnitude and approaches the amorphous limit. With a ZT value of ∼0.4 at room temperature, the thermoelectric performance of HS is comparable with the best value recorded in silicon nanowire system. © 2010 American Chemical Society. | en_US |
dc.language | eng | en_US |
dc.publisher | American Chemical Society. The Journal's web site is located at http://pubs.acs.org/nanolett | en_US |
dc.relation.ispartof | Nano Letters | en_US |
dc.subject | Nanostructure | en_US |
dc.subject | Necking | en_US |
dc.subject | Silicon | en_US |
dc.subject | Thermal Conductivity | en_US |
dc.subject | Thermoelectric | en_US |
dc.title | Holey silicon as an efficient thermoelectric material | en_US |
dc.type | Article | en_US |
dc.identifier.email | Tang, J: jinyao@hku.hk | en_US |
dc.identifier.authority | Tang, J=rp01677 | en_US |
dc.description.nature | link_to_subscribed_fulltext | en_US |
dc.identifier.doi | 10.1021/nl102931z | en_US |
dc.identifier.pmid | 20839780 | - |
dc.identifier.scopus | eid_2-s2.0-77958033784 | en_US |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-77958033784&selection=ref&src=s&origin=recordpage | en_US |
dc.identifier.volume | 10 | en_US |
dc.identifier.issue | 10 | en_US |
dc.identifier.spage | 4279 | en_US |
dc.identifier.epage | 4283 | en_US |
dc.identifier.isi | WOS:000282727600080 | - |
dc.publisher.place | United States | en_US |
dc.identifier.scopusauthorid | Tang, J=12791614900 | en_US |
dc.identifier.scopusauthorid | Wang, HT=36674201200 | en_US |
dc.identifier.scopusauthorid | Lee, DH=34870035100 | en_US |
dc.identifier.scopusauthorid | Fardy, M=22933945300 | en_US |
dc.identifier.scopusauthorid | Huo, Z=8953609200 | en_US |
dc.identifier.scopusauthorid | Russell, TP=7202045987 | en_US |
dc.identifier.scopusauthorid | Yang, P=7403931988 | en_US |
dc.identifier.issnl | 1530-6984 | - |