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Article: Effect of Ni addition into Co ferrite thin films for perpendicular recording media

TitleEffect of Ni addition into Co ferrite thin films for perpendicular recording media
Authors
Issue Date2000
PublisherAmerican Institute of Physics. The Journal's web site is located at http://jap.aip.org/jap/staff.jsp
Citation
Journal of Applied Physics, 2000, v. 87 n. 9, p. 6881-6883 How to Cite?
AbstractThe present article describes effects of doping Ni 2+ ions into Co ferrite plated films on film structure, magnetic properties, and read/write characteristics. While thinner films are required for low noise level even in perpendicular recording media, average surface roughness R a of the Co ferrite films increased from 4 to 6 nm with decreasing the film thickness from 100 to 50 nm. Adding Ni 2+ ions had an effect on controlling the grain growth, resulting in a reduction in R a to 3-4 nm for the 50-nm-thick films by adding a small amount of Ni 2+ ions {r m[=C Ni/(C Co+C Ni)]=0.1}. Perpendicular coercivity H c⊥ of the Co-Ni ferrite film at r m=0.1 was 2500 Oe, which is almost the same as that of the Co ferrite films, and H c⊥ decreased with increasing r m. Atomic force microscope images showed that the Co-Ni ferrite films were composed of uniform and isolated grains without coagulation. As a result, a Co-Ni ferrite medium fabricated at r m=0.1 exhibited lower noise level than a Co ferrite medium without Ni addition. © 2000 American Institute of Physics.
Persistent Identifierhttp://hdl.handle.net/10722/174857
ISSN
2021 Impact Factor: 2.877
2020 SCImago Journal Rankings: 0.699
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorZhang, Fen_US
dc.contributor.authorKitamoto, Yen_US
dc.contributor.authorAbe, Men_US
dc.contributor.authorNaoe, Men_US
dc.date.accessioned2012-11-26T08:47:50Z-
dc.date.available2012-11-26T08:47:50Z-
dc.date.issued2000en_US
dc.identifier.citationJournal of Applied Physics, 2000, v. 87 n. 9, p. 6881-6883-
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://hdl.handle.net/10722/174857-
dc.description.abstractThe present article describes effects of doping Ni 2+ ions into Co ferrite plated films on film structure, magnetic properties, and read/write characteristics. While thinner films are required for low noise level even in perpendicular recording media, average surface roughness R a of the Co ferrite films increased from 4 to 6 nm with decreasing the film thickness from 100 to 50 nm. Adding Ni 2+ ions had an effect on controlling the grain growth, resulting in a reduction in R a to 3-4 nm for the 50-nm-thick films by adding a small amount of Ni 2+ ions {r m[=C Ni/(C Co+C Ni)]=0.1}. Perpendicular coercivity H c⊥ of the Co-Ni ferrite film at r m=0.1 was 2500 Oe, which is almost the same as that of the Co ferrite films, and H c⊥ decreased with increasing r m. Atomic force microscope images showed that the Co-Ni ferrite films were composed of uniform and isolated grains without coagulation. As a result, a Co-Ni ferrite medium fabricated at r m=0.1 exhibited lower noise level than a Co ferrite medium without Ni addition. © 2000 American Institute of Physics.en_US
dc.languageengen_US
dc.publisherAmerican Institute of Physics. The Journal's web site is located at http://jap.aip.org/jap/staff.jspen_US
dc.relation.ispartofJournal of Applied Physicsen_US
dc.titleEffect of Ni addition into Co ferrite thin films for perpendicular recording mediaen_US
dc.typeArticleen_US
dc.identifier.emailZhang, F: fuchun@hkucc.hku.hken_US
dc.identifier.authorityZhang, F=rp00840en_US
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.doi10.1063/1.372873-
dc.identifier.scopuseid_2-s2.0-0040973563en_US
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-0040973563&selection=ref&src=s&origin=recordpageen_US
dc.identifier.volume87en_US
dc.identifier.issue9-
dc.identifier.spage6881en_US
dc.identifier.epage6883en_US
dc.identifier.isiWOS:000086728800323-
dc.publisher.placeUnited Statesen_US
dc.identifier.scopusauthoridZhang, F=14012468800en_US
dc.identifier.scopusauthoridKitamoto, Y=7006209500en_US
dc.identifier.scopusauthoridAbe, M=8539881800en_US
dc.identifier.scopusauthoridNaoe, M=35467285400en_US
dc.identifier.issnl0021-8979-

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