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- Publisher Website: 10.1016/j.cplett.2013.06.022
- Scopus: eid_2-s2.0-84880329199
- WOS: WOS:000322558200016
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Article: Study of the thermal stability of the H-related donors in high resistivity ZnO:Cu thin films by high-pressure H2 treatment
Title | Study of the thermal stability of the H-related donors in high resistivity ZnO:Cu thin films by high-pressure H2 treatment |
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Authors | |
Issue Date | 2013 |
Publisher | Elsevier B.V.. The Journal's web site is located at http://www.elsevier.com/locate/cplett |
Citation | Chemical Physics Letters, 2013, v. 579, p. 90-93 How to Cite? |
Persistent Identifier | http://hdl.handle.net/10722/186168 |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | Cai, X | en_US |
dc.contributor.author | Liang, HW | en_US |
dc.contributor.author | Liu, YD | en_US |
dc.contributor.author | Shen, RS | en_US |
dc.contributor.author | Xia, XC | en_US |
dc.contributor.author | Liu, Y | en_US |
dc.contributor.author | Ling, FCC | en_US |
dc.contributor.author | Du, GT | en_US |
dc.date.accessioned | 2013-08-20T11:57:25Z | - |
dc.date.available | 2013-08-20T11:57:25Z | - |
dc.date.issued | 2013 | en_US |
dc.identifier.citation | Chemical Physics Letters, 2013, v. 579, p. 90-93 | en_US |
dc.identifier.uri | http://hdl.handle.net/10722/186168 | - |
dc.language | eng | en_US |
dc.publisher | Elsevier B.V.. The Journal's web site is located at http://www.elsevier.com/locate/cplett | en_US |
dc.relation.ispartof | Chemical Physics Letters | en_US |
dc.title | Study of the thermal stability of the H-related donors in high resistivity ZnO:Cu thin films by high-pressure H2 treatment | en_US |
dc.type | Article | en_US |
dc.identifier.email | Ling, FCC: ccling@hkucc.hku.hk | en_US |
dc.identifier.authority | Ling, FCC=rp00747 | en_US |
dc.identifier.doi | 10.1016/j.cplett.2013.06.022 | - |
dc.identifier.scopus | eid_2-s2.0-84880329199 | - |
dc.identifier.hkuros | 218998 | en_US |
dc.identifier.volume | 579 | en_US |
dc.identifier.spage | 90 | en_US |
dc.identifier.epage | 93 | en_US |
dc.identifier.isi | WOS:000322558200016 | - |
dc.publisher.place | Amsterdam | en_US |