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Article: Low cost universal High-k dielectric for solution processing and thermal evaporation organic transistors

TitleLow cost universal High-k dielectric for solution processing and thermal evaporation organic transistors
Authors
Wang, ZREN, XFan, CCCHANG, YHLi, HYChen, HZFeng, SPTShi, SQChan, KL
Keywordshigh-k dielectric
organic transistors
surface energy
X-ray diffraction
Issue Date2014
Citation
Advanced Materials Interfaces, 2014, v. 1 n. 3, p. 1300119 How to Cite?
DOI: http://dx.doi.org/10.1002/admi.201300119
Persistent Identifierhttp://hdl.handle.net/10722/199132
ISI Accession Number ID
WOS:000348282900019

 

DC FieldValueLanguage
dc.contributor.authorWang, Zen_US
dc.contributor.authorREN, Xen_US
dc.contributor.authorFan, CCen_US
dc.contributor.authorCHANG, YHen_US
dc.contributor.authorLi, HYen_US
dc.contributor.authorChen, HZen_US
dc.contributor.authorFeng, SPTen_US
dc.contributor.authorShi, SQen_US
dc.contributor.authorChan, KLen_US
dc.date.accessioned2014-07-22T01:04:14Z-
dc.date.available2014-07-22T01:04:14Z-
dc.date.issued2014en_US
dc.identifier.citationAdvanced Materials Interfaces, 2014, v. 1 n. 3, p. 1300119en_US
dc.identifier.urihttp://hdl.handle.net/10722/199132-
dc.languageengen_US
dc.relation.ispartofAdvanced Materials Interfacesen_US
dc.subjecthigh-k dielectric-
dc.subjectorganic transistors-
dc.subjectsurface energy-
dc.subjectX-ray diffraction-
dc.titleLow cost universal High-k dielectric for solution processing and thermal evaporation organic transistorsen_US
dc.typeArticleen_US
dc.identifier.emailFeng, SPT: hpfeng@hku.hken_US
dc.identifier.emailChan, KL: pklc@hku.hken_US
dc.identifier.authorityFeng, SPT=rp01533en_US
dc.identifier.authorityChan, KL=rp01532en_US
dc.identifier.doi10.1002/admi.201300119-
dc.identifier.scopuseid_2-s2.0-84942250576-
dc.identifier.hkuros231422en_US
dc.identifier.volume1en_US
dc.identifier.issue3en_US
dc.identifier.spage1300119en_US
dc.identifier.epage1300119en_US
dc.identifier.isiWOS:000348282900019-

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