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Article: Effect of Plasma Treatment on Native Defects and Photocatalytic Activities of Zinc Oxide Tetrapods

TitleEffect of Plasma Treatment on Native Defects and Photocatalytic Activities of Zinc Oxide Tetrapods
Authors
Issue Date2014
PublisherAmerican Chemical Society.
Citation
Physical Chemistry C, 2014, v. 118, p. 22760-22767 How to Cite?
Persistent Identifierhttp://hdl.handle.net/10722/207227
ISSN
2021 Impact Factor: 4.177
2020 SCImago Journal Rankings: 1.401
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorLIU, Fen_US
dc.contributor.authorLeung, YHen_US
dc.contributor.authorDjurisic, Aen_US
dc.contributor.authorNg, AMCen_US
dc.contributor.authorChan, WKen_US
dc.contributor.authorNg, KLen_US
dc.contributor.authorWong, KSen_US
dc.contributor.authorLiao, Cen_US
dc.contributor.authorShih, Ken_US
dc.contributor.authorSurya, Cen_US
dc.date.accessioned2014-12-19T09:03:17Z-
dc.date.available2014-12-19T09:03:17Z-
dc.date.issued2014en_US
dc.identifier.citationPhysical Chemistry C, 2014, v. 118, p. 22760-22767en_US
dc.identifier.issn1932-7447-
dc.identifier.urihttp://hdl.handle.net/10722/207227-
dc.languageengen_US
dc.publisherAmerican Chemical Society.en_US
dc.relation.ispartofPhysical Chemistry Cen_US
dc.titleEffect of Plasma Treatment on Native Defects and Photocatalytic Activities of Zinc Oxide Tetrapodsen_US
dc.typeArticleen_US
dc.identifier.emailLeung, YH: ianleung@hku.hken_US
dc.identifier.emailDjurisic, A: dalek@hku.hken_US
dc.identifier.emailNg, AMC: alanalfa@hku.hken_US
dc.identifier.emailChan, WK: waichan@hku.hken_US
dc.identifier.emailLiao, C: liaocz@hku.hken_US
dc.identifier.emailShih, K: kshih@hku.hken_US
dc.identifier.authorityLeung, YH=rp01770en_US
dc.identifier.authorityDjurisic, A=rp00690en_US
dc.identifier.authorityChan, WK=rp00667en_US
dc.identifier.authorityShih, K=rp00167en_US
dc.identifier.doi10.1021/jp506468ren_US
dc.identifier.scopuseid_2-s2.0-84907781868-
dc.identifier.hkuros241824en_US
dc.identifier.volume118en_US
dc.identifier.spage22760en_US
dc.identifier.epage22767en_US
dc.identifier.eissn1932-7455-
dc.identifier.isiWOS:000342652000041-
dc.identifier.issnl1932-7447-

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