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Article: Centimeter-Scale Subwavelength Photolithography Using Metal-Coated Elastomeric Photomasks with Modulated Light Intensity at the Oblique Sidewalls

TitleCentimeter-Scale Subwavelength Photolithography Using Metal-Coated Elastomeric Photomasks with Modulated Light Intensity at the Oblique Sidewalls
Authors
Wu, JLiu, YGuo, YFeng, SZou, BMao, HYu, CTian, DHuang, WHuo, F
Issue Date2015
Citation
Langmuir, 2015, v. 31, p. 5005-5013 How to Cite?
DOI: http://dx.doi.org/10.1021/acs.langmuir.5b00568
Persistent Identifierhttp://hdl.handle.net/10722/214975
ISSN
0743-7463
2021 Impact Factor: 4.331
2020 SCImago Journal Rankings: 1.042
ISI Accession Number ID
WOS:000354154100024

 

DC FieldValueLanguage
dc.contributor.authorWu, J-
dc.contributor.authorLiu, Y-
dc.contributor.authorGuo, Y-
dc.contributor.authorFeng, S-
dc.contributor.authorZou, B-
dc.contributor.authorMao, H-
dc.contributor.authorYu, C-
dc.contributor.authorTian, D-
dc.contributor.authorHuang, W-
dc.contributor.authorHuo, F-
dc.date.accessioned2015-08-21T12:15:41Z-
dc.date.available2015-08-21T12:15:41Z-
dc.date.issued2015-
dc.identifier.citationLangmuir, 2015, v. 31, p. 5005-5013-
dc.identifier.issn0743-7463-
dc.identifier.urihttp://hdl.handle.net/10722/214975-
dc.languageeng-
dc.relation.ispartofLangmuir-
dc.titleCentimeter-Scale Subwavelength Photolithography Using Metal-Coated Elastomeric Photomasks with Modulated Light Intensity at the Oblique Sidewalls-
dc.typeArticle-
dc.identifier.emailYu, C: chyu1@hku.hk-
dc.identifier.authorityYu, C=rp01930-
dc.identifier.doi10.1021/acs.langmuir.5b00568-
dc.identifier.scopuseid_2-s2.0-84928966671-
dc.identifier.hkuros249156-
dc.identifier.volume31-
dc.identifier.spage5005-
dc.identifier.epage5013-
dc.identifier.eissn1520-5827-
dc.identifier.isiWOS:000354154100024-
dc.identifier.issnl0743-7463-

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