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Book Chapter: Theoretical Pore Growth Models for Nanoporous Alumina
Title | Theoretical Pore Growth Models for Nanoporous Alumina |
---|---|
Authors | |
Issue Date | 2015 |
Publisher | Springer |
Citation | Theoretical Pore Growth Models for Nanoporous Alumina. In Dusan Losic & Abel Santos (Eds.), Nanoporous Alumina: Fabrication, Structure, Properties and Applications, p. 31-60. Cham: Springer, 2015 How to Cite? |
Abstract | Nanoporous alumina has been extensively used in a wide range of applications, including template materials for various types of nanomaterials, high surface-area structures for energy conversation and storage, bio/chemo sensors, electronic/photonic devices, and so on. However, the formation mechanism of the nanopores and the subsequent pore growth process towards self-ordered pore arrangements have been under investigation for several decades without clear conclusions. The present models may be divided into two main groups in terms of the driving force for pore initialization, as well as the subsequent pore growth process. One group considers that the driving force is the high electric field across the oxide barrier layer at the bottom of the pore channels, which assists metal oxidation at the metal/oxide interface, and oxide dissolution at the oxide/electrolyte interface. The other group of models assumes that the driving force is mechanical stress originating from the volume expansion of the metal oxidation process. This chapter reviews the development of these models for nanoporous alumina formation, and discusses their advantages and shortcomings. A recent model proposed by us is also described, and potential directions for further development are discussed. |
Persistent Identifier | http://hdl.handle.net/10722/218352 |
ISBN | |
ISSN | 2020 SCImago Journal Rankings: 0.154 |
DC Field | Value | Language |
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dc.contributor.author | Cheng, C | - |
dc.contributor.author | Ngan, AHW | - |
dc.date.accessioned | 2015-09-18T06:34:43Z | - |
dc.date.available | 2015-09-18T06:34:43Z | - |
dc.date.issued | 2015 | - |
dc.identifier.citation | Theoretical Pore Growth Models for Nanoporous Alumina. In Dusan Losic & Abel Santos (Eds.), Nanoporous Alumina: Fabrication, Structure, Properties and Applications, p. 31-60. Cham: Springer, 2015 | - |
dc.identifier.isbn | 9783319203331 | - |
dc.identifier.issn | 0933-033X | - |
dc.identifier.uri | http://hdl.handle.net/10722/218352 | - |
dc.description.abstract | Nanoporous alumina has been extensively used in a wide range of applications, including template materials for various types of nanomaterials, high surface-area structures for energy conversation and storage, bio/chemo sensors, electronic/photonic devices, and so on. However, the formation mechanism of the nanopores and the subsequent pore growth process towards self-ordered pore arrangements have been under investigation for several decades without clear conclusions. The present models may be divided into two main groups in terms of the driving force for pore initialization, as well as the subsequent pore growth process. One group considers that the driving force is the high electric field across the oxide barrier layer at the bottom of the pore channels, which assists metal oxidation at the metal/oxide interface, and oxide dissolution at the oxide/electrolyte interface. The other group of models assumes that the driving force is mechanical stress originating from the volume expansion of the metal oxidation process. This chapter reviews the development of these models for nanoporous alumina formation, and discusses their advantages and shortcomings. A recent model proposed by us is also described, and potential directions for further development are discussed. | - |
dc.language | eng | - |
dc.publisher | Springer | - |
dc.relation.ispartof | Nanoporous Alumina: Fabrication, Structure, Properties and Applications | - |
dc.rights | The final publication is available at Springer via http://dx.doi.org/10.1007/978-3-319-20334-8_2 | - |
dc.title | Theoretical Pore Growth Models for Nanoporous Alumina | - |
dc.type | Book_Chapter | - |
dc.identifier.email | Ngan, AHW: hwngan@hku.hk | - |
dc.identifier.authority | Ngan, AHW=rp00225 | - |
dc.description.nature | postprint | - |
dc.identifier.doi | 10.1007/978-3-319-20334-8_2 | - |
dc.identifier.scopus | eid_2-s2.0-84937397926 | - |
dc.identifier.hkuros | 251863 | - |
dc.identifier.spage | 31 | - |
dc.identifier.epage | 60 | - |
dc.identifier.eissn | 2196-2812 | - |
dc.publisher.place | Cham | - |
dc.identifier.issnl | 0933-033X | - |