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Article: Electrospun aggregation-induced emission active POSS-based porous copolymer films for detection of explosives

TitleElectrospun aggregation-induced emission active POSS-based porous copolymer films for detection of explosives
Authors
Issue Date2014
Citation
Chemical Communications, 2014, v. 50, n. 89, p. 13785-13788 How to Cite?
Abstract© the Partner Organisations 2014.Electrospun aggregation-induced emission (AIE)-active polyhedral oligomeric silsesquioxane (POSS)-based copolymer films exhibit an approximately 9-fold increase in response to explosive vapors compared to dense films although porous copolymer films have a thickness as high as 560 ± 60 nm. This journal is
Persistent Identifierhttp://hdl.handle.net/10722/237616
ISSN
2023 Impact Factor: 4.3
2023 SCImago Journal Rankings: 1.133
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorZhou, Hui-
dc.contributor.authorYe, Qun-
dc.contributor.authorNeo, Wei Teng-
dc.contributor.authorSong, Jing-
dc.contributor.authorYan, Hong-
dc.contributor.authorZong, Yun-
dc.contributor.authorTang, Ben Zhong-
dc.contributor.authorHor, T. S Andy-
dc.contributor.authorXu, Jianwei-
dc.date.accessioned2017-01-16T06:10:14Z-
dc.date.available2017-01-16T06:10:14Z-
dc.date.issued2014-
dc.identifier.citationChemical Communications, 2014, v. 50, n. 89, p. 13785-13788-
dc.identifier.issn1359-7345-
dc.identifier.urihttp://hdl.handle.net/10722/237616-
dc.description.abstract© the Partner Organisations 2014.Electrospun aggregation-induced emission (AIE)-active polyhedral oligomeric silsesquioxane (POSS)-based copolymer films exhibit an approximately 9-fold increase in response to explosive vapors compared to dense films although porous copolymer films have a thickness as high as 560 ± 60 nm. This journal is-
dc.languageeng-
dc.relation.ispartofChemical Communications-
dc.titleElectrospun aggregation-induced emission active POSS-based porous copolymer films for detection of explosives-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1039/c4cc06559j-
dc.identifier.scopuseid_2-s2.0-84908388189-
dc.identifier.volume50-
dc.identifier.issue89-
dc.identifier.spage13785-
dc.identifier.epage13788-
dc.identifier.eissn1364-548X-
dc.identifier.isiWOS:000343988200036-
dc.identifier.issnl1359-7345-

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