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Article: Large influence of capping layers on tunnel magnetoresistance in magnetic tunnel junctions

TitleLarge influence of capping layers on tunnel magnetoresistance in magnetic tunnel junctions
Authors
Zhou, JZhao, WWang, YPeng, SQiao, JSu, LZeng, LLei, NLiu, LZhang, YBournel, A
Issue Date2016
PublisherAmerican Institute of Physics. The Journal's web site is located at http://apl.aip.org/
Citation
Applied Physics Letters, 2016, v. 109 n. 24, article no. 242403, p. 1-4 How to Cite?
DOI: http://dx.doi.org/10.1063/1.4972030
Persistent Identifierhttp://hdl.handle.net/10722/237774
ISSN
0003-6951
2023 Impact Factor: 3.5
2023 SCImago Journal Rankings: 0.976
ISI Accession Number ID
WOS:000391457500026

 

DC FieldValueLanguage
dc.contributor.authorZhou, J-
dc.contributor.authorZhao, W-
dc.contributor.authorWang, Y-
dc.contributor.authorPeng, S-
dc.contributor.authorQiao, J-
dc.contributor.authorSu, L-
dc.contributor.authorZeng, L-
dc.contributor.authorLei, N-
dc.contributor.authorLiu, L-
dc.contributor.authorZhang, Y-
dc.contributor.authorBournel, A-
dc.date.accessioned2017-01-20T02:28:22Z-
dc.date.available2017-01-20T02:28:22Z-
dc.date.issued2016-
dc.identifier.citationApplied Physics Letters, 2016, v. 109 n. 24, article no. 242403, p. 1-4-
dc.identifier.issn0003-6951-
dc.identifier.urihttp://hdl.handle.net/10722/237774-
dc.languageeng-
dc.publisherAmerican Institute of Physics. The Journal's web site is located at http://apl.aip.org/-
dc.relation.ispartofApplied Physics Letters-
dc.rightsThis article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Applied Physics Letters, 2016, v. 109 n. 24, article no. 242403, p. 1-4 and may be found at https://doi.org/10.1063/1.4972030-
dc.titleLarge influence of capping layers on tunnel magnetoresistance in magnetic tunnel junctions-
dc.typeArticle-
dc.identifier.emailWang, Y: yinwang@hku.hk-
dc.identifier.authorityWang, Y=rp01851-
dc.description.naturepublished_or_final_version-
dc.identifier.doi10.1063/1.4972030-
dc.identifier.scopuseid_2-s2.0-85007012469-
dc.identifier.hkuros270936-
dc.identifier.volume109-
dc.identifier.issue24-
dc.identifier.spagearticle no. 242403, p. 1-
dc.identifier.epagearticle no. 242403, p. 4-
dc.identifier.isiWOS:000391457500026-
dc.publisher.placeUnited States-
dc.identifier.issnl0003-6951-

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