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Article: Characterization of Low-Frequency Excess Noise in CH3NH3PbI3- Based Solar Cells Grown by Solution and Hybrid Chemical Vapor Deposition Techniques

TitleCharacterization of Low-Frequency Excess Noise in CH<font size=-1><sub>3</sub></font>NH<font size=-1><sub>3</sub></font>PbI<font size=-1><sub>3</sub></font>- Based Solar Cells Grown by Solution and Hybrid Chemical Vapor Deposition Techniques
Authors
Shen, QNg, ARen, ZWGokkaya, HCDjurisic, AZapien, JASurya, C
Keywordschemical vapor deposition
defect passivation
low-frequency noise
perovskite solar cells
stability
Issue Date2018
PublisherAmerican Chemical Society. The Journal's web site is located at http://pubs.acs.org/journal/aamick
Citation
ACS Applied Materials & Interfaces, 2018, v. 10 n. 1, p. 371-380 How to Cite?
DOI: http://dx.doi.org/10.1021/acsami.7b10091
Persistent Identifierhttp://hdl.handle.net/10722/251456
ISSN
1944-8244
2023 Impact Factor: 8.3
2023 SCImago Journal Rankings: 2.058
ISI Accession Number ID
WOS:000422814400041

 

DC FieldValueLanguage
dc.contributor.authorShen, Q-
dc.contributor.authorNg, A-
dc.contributor.authorRen, ZW-
dc.contributor.authorGokkaya, HC-
dc.contributor.authorDjurisic, A-
dc.contributor.authorZapien, JA-
dc.contributor.authorSurya, C-
dc.date.accessioned2018-03-01T03:39:34Z-
dc.date.available2018-03-01T03:39:34Z-
dc.date.issued2018-
dc.identifier.citationACS Applied Materials & Interfaces, 2018, v. 10 n. 1, p. 371-380-
dc.identifier.issn1944-8244-
dc.identifier.urihttp://hdl.handle.net/10722/251456-
dc.languageeng-
dc.publisherAmerican Chemical Society. The Journal's web site is located at http://pubs.acs.org/journal/aamick-
dc.relation.ispartofACS Applied Materials & Interfaces-
dc.subjectchemical vapor deposition-
dc.subjectdefect passivation-
dc.subjectlow-frequency noise-
dc.subjectperovskite solar cells-
dc.subjectstability-
dc.titleCharacterization of Low-Frequency Excess Noise in CH<font size=-1><sub>3</sub></font>NH<font size=-1><sub>3</sub></font>PbI<font size=-1><sub>3</sub></font>- Based Solar Cells Grown by Solution and Hybrid Chemical Vapor Deposition Techniques -
dc.typeArticle-
dc.identifier.emailDjurisic, A: dalek@hku.hk-
dc.identifier.authorityDjurisic, A=rp00690-
dc.identifier.doi10.1021/acsami.7b10091-
dc.identifier.scopuseid_2-s2.0-85040334340-
dc.identifier.hkuros284285-
dc.identifier.volume10-
dc.identifier.issue1-
dc.identifier.spage371-
dc.identifier.epage380-
dc.identifier.eissn1944-8252-
dc.identifier.isiWOS:000422814400041-
dc.identifier.issnl1944-8244-

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