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- Publisher Website: 10.1021/nl049573q
- Scopus: eid_2-s2.0-3042799702
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Article: Plasmonic nanolithography
Title | Plasmonic nanolithography |
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Authors | |
Issue Date | 2004 |
Citation | Nano Letters, 2004, v. 4, n. 6, p. 1085-1088 How to Cite? |
Abstract | In this paper, we demonstrate high-density nanolithography by utilizing surface plasmons (SPs). SPs are excited on an aluminum substrate perforated with 2-D hole arrays using a near UV light source in order to resolve sub-wavelength features with high transmission. Our lithography experiments using a 365 nm wavelength light source demonstrate 90 nm dot array patterns on a 170 nm period, well beyond the diffraction limit of far-field optical lithography. In far-field transmission measurements, strong UV light transmission and the wavelength-dependent transmission are observed, which confirms the contribution of SPs. Furthermore, an exposure with larger spacing between the mask and photoresist has been explored for potential noncontact lithography. |
Persistent Identifier | http://hdl.handle.net/10722/256916 |
ISSN | 2023 Impact Factor: 9.6 2023 SCImago Journal Rankings: 3.411 |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | Srituravanich, Werayut | - |
dc.contributor.author | Fang, Nicholas | - |
dc.contributor.author | Sun, Cheng | - |
dc.contributor.author | Luo, Qi | - |
dc.contributor.author | Zhang, Xiang | - |
dc.date.accessioned | 2018-07-24T08:58:19Z | - |
dc.date.available | 2018-07-24T08:58:19Z | - |
dc.date.issued | 2004 | - |
dc.identifier.citation | Nano Letters, 2004, v. 4, n. 6, p. 1085-1088 | - |
dc.identifier.issn | 1530-6984 | - |
dc.identifier.uri | http://hdl.handle.net/10722/256916 | - |
dc.description.abstract | In this paper, we demonstrate high-density nanolithography by utilizing surface plasmons (SPs). SPs are excited on an aluminum substrate perforated with 2-D hole arrays using a near UV light source in order to resolve sub-wavelength features with high transmission. Our lithography experiments using a 365 nm wavelength light source demonstrate 90 nm dot array patterns on a 170 nm period, well beyond the diffraction limit of far-field optical lithography. In far-field transmission measurements, strong UV light transmission and the wavelength-dependent transmission are observed, which confirms the contribution of SPs. Furthermore, an exposure with larger spacing between the mask and photoresist has been explored for potential noncontact lithography. | - |
dc.language | eng | - |
dc.relation.ispartof | Nano Letters | - |
dc.title | Plasmonic nanolithography | - |
dc.type | Article | - |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1021/nl049573q | - |
dc.identifier.scopus | eid_2-s2.0-3042799702 | - |
dc.identifier.volume | 4 | - |
dc.identifier.issue | 6 | - |
dc.identifier.spage | 1085 | - |
dc.identifier.epage | 1088 | - |
dc.identifier.isi | WOS:000221978700016 | - |
dc.identifier.issnl | 1530-6984 | - |