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Article: Plasmonic nanolithography

TitlePlasmonic nanolithography
Authors
Issue Date2004
Citation
Nano Letters, 2004, v. 4, n. 6, p. 1085-1088 How to Cite?
AbstractIn this paper, we demonstrate high-density nanolithography by utilizing surface plasmons (SPs). SPs are excited on an aluminum substrate perforated with 2-D hole arrays using a near UV light source in order to resolve sub-wavelength features with high transmission. Our lithography experiments using a 365 nm wavelength light source demonstrate 90 nm dot array patterns on a 170 nm period, well beyond the diffraction limit of far-field optical lithography. In far-field transmission measurements, strong UV light transmission and the wavelength-dependent transmission are observed, which confirms the contribution of SPs. Furthermore, an exposure with larger spacing between the mask and photoresist has been explored for potential noncontact lithography.
Persistent Identifierhttp://hdl.handle.net/10722/256916
ISSN
2020 Impact Factor: 11.189
2015 SCImago Journal Rankings: 9.006
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorSrituravanich, Werayut-
dc.contributor.authorFang, Nicholas-
dc.contributor.authorSun, Cheng-
dc.contributor.authorLuo, Qi-
dc.contributor.authorZhang, Xiang-
dc.date.accessioned2018-07-24T08:58:19Z-
dc.date.available2018-07-24T08:58:19Z-
dc.date.issued2004-
dc.identifier.citationNano Letters, 2004, v. 4, n. 6, p. 1085-1088-
dc.identifier.issn1530-6984-
dc.identifier.urihttp://hdl.handle.net/10722/256916-
dc.description.abstractIn this paper, we demonstrate high-density nanolithography by utilizing surface plasmons (SPs). SPs are excited on an aluminum substrate perforated with 2-D hole arrays using a near UV light source in order to resolve sub-wavelength features with high transmission. Our lithography experiments using a 365 nm wavelength light source demonstrate 90 nm dot array patterns on a 170 nm period, well beyond the diffraction limit of far-field optical lithography. In far-field transmission measurements, strong UV light transmission and the wavelength-dependent transmission are observed, which confirms the contribution of SPs. Furthermore, an exposure with larger spacing between the mask and photoresist has been explored for potential noncontact lithography.-
dc.languageeng-
dc.relation.ispartofNano Letters-
dc.titlePlasmonic nanolithography-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1021/nl049573q-
dc.identifier.scopuseid_2-s2.0-3042799702-
dc.identifier.volume4-
dc.identifier.issue6-
dc.identifier.spage1085-
dc.identifier.epage1088-
dc.identifier.isiWOS:000221978700016-
dc.identifier.issnl1530-6984-

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