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- Publisher Website: 10.1007/s00339-004-2938-x
- Scopus: eid_2-s2.0-6344256428
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Article: Diffusion-limited photopolymerization in scanning micro-stereolithography
Title | Diffusion-limited photopolymerization in scanning micro-stereolithography |
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Authors | |
Issue Date | 2004 |
Citation | Applied Physics A: Materials Science and Processing, 2004, v. 79, n. 8, p. 1839-1842 How to Cite? |
Abstract | The trade-off between process speed and resolution in microstereolithography (μSL) roots on the diffusion-limited kinetics of photopolymerization. Using a numerical model, we have investigated the influence of diffusion dominant effect under high photon flux. Radical depletion turned out to limit the smallest feature achievable to the order of 10 μm under high process speed. A solution of pulsed laser curing is proposed in order to realize sub-micron resolution in high speed μSL process. |
Persistent Identifier | http://hdl.handle.net/10722/256998 |
ISSN | 2023 Impact Factor: 2.5 2023 SCImago Journal Rankings: 0.446 |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | Fang, N. | - |
dc.contributor.author | Sun, C. | - |
dc.contributor.author | Zhang, X. | - |
dc.date.accessioned | 2018-07-24T08:58:33Z | - |
dc.date.available | 2018-07-24T08:58:33Z | - |
dc.date.issued | 2004 | - |
dc.identifier.citation | Applied Physics A: Materials Science and Processing, 2004, v. 79, n. 8, p. 1839-1842 | - |
dc.identifier.issn | 0947-8396 | - |
dc.identifier.uri | http://hdl.handle.net/10722/256998 | - |
dc.description.abstract | The trade-off between process speed and resolution in microstereolithography (μSL) roots on the diffusion-limited kinetics of photopolymerization. Using a numerical model, we have investigated the influence of diffusion dominant effect under high photon flux. Radical depletion turned out to limit the smallest feature achievable to the order of 10 μm under high process speed. A solution of pulsed laser curing is proposed in order to realize sub-micron resolution in high speed μSL process. | - |
dc.language | eng | - |
dc.relation.ispartof | Applied Physics A: Materials Science and Processing | - |
dc.title | Diffusion-limited photopolymerization in scanning micro-stereolithography | - |
dc.type | Article | - |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1007/s00339-004-2938-x | - |
dc.identifier.scopus | eid_2-s2.0-6344256428 | - |
dc.identifier.volume | 79 | - |
dc.identifier.issue | 8 | - |
dc.identifier.spage | 1839 | - |
dc.identifier.epage | 1842 | - |
dc.identifier.isi | WOS:000224387200002 | - |
dc.identifier.issnl | 0947-8396 | - |