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Article: Near-field two-photon nanolithography using an apertureless optical probe

TitleNear-field two-photon nanolithography using an apertureless optical probe
Authors
Issue Date2002
PublisherAmerican Institute of Physics. The Journal's web site is located at http://apl.aip.org/
Citation
Applied Physics Letters, 2002, v. 81 n. 19, p. 3663-3665 How to Cite?
AbstractNear-field two-photon optical lithography is demonstrated by using ∼120 fs laser pulses at 790 nm in an apertureless near-field optical microscope, which produces lithographic features with ∼70 nm resolution. The technique takes advantage of the field enhancement at the extremity of a metallic probe to induce nanoscale two-photon absorption and polymerization in a commercial photoresist, SU-8. Even without optimization of the resist or laser pulses, the spatial resolution of this technique is as high as λ/10, nearly a factor of 2 better than techniques based on far field two-photon lithography. © 2002 American Institute of Physics.
Persistent Identifierhttp://hdl.handle.net/10722/257067
ISSN
2020 Impact Factor: 3.791
2020 SCImago Journal Rankings: 1.182
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorYin, Xiaobo-
dc.contributor.authorFang, Nicholas-
dc.contributor.authorZhang, Xiang-
dc.contributor.authorMartini, Ignacio B.-
dc.contributor.authorSchwartz, Benjamin J.-
dc.date.accessioned2018-07-24T08:58:44Z-
dc.date.available2018-07-24T08:58:44Z-
dc.date.issued2002-
dc.identifier.citationApplied Physics Letters, 2002, v. 81 n. 19, p. 3663-3665-
dc.identifier.issn0003-6951-
dc.identifier.urihttp://hdl.handle.net/10722/257067-
dc.description.abstractNear-field two-photon optical lithography is demonstrated by using ∼120 fs laser pulses at 790 nm in an apertureless near-field optical microscope, which produces lithographic features with ∼70 nm resolution. The technique takes advantage of the field enhancement at the extremity of a metallic probe to induce nanoscale two-photon absorption and polymerization in a commercial photoresist, SU-8. Even without optimization of the resist or laser pulses, the spatial resolution of this technique is as high as λ/10, nearly a factor of 2 better than techniques based on far field two-photon lithography. © 2002 American Institute of Physics.-
dc.languageeng-
dc.publisherAmerican Institute of Physics. The Journal's web site is located at http://apl.aip.org/-
dc.relation.ispartofApplied Physics Letters-
dc.titleNear-field two-photon nanolithography using an apertureless optical probe-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1063/1.1519329-
dc.identifier.scopuseid_2-s2.0-79956057132-
dc.identifier.volume81-
dc.identifier.issue19-
dc.identifier.spage3663-
dc.identifier.epage3665-
dc.identifier.isiWOS:000178935200049-
dc.identifier.issnl0003-6951-

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