File Download
There are no files associated with this item.
Links for fulltext
(May Require Subscription)
- Publisher Website: 10.1117/12.792018
- Scopus: eid_2-s2.0-42149176230
- Find via
Supplementary
-
Citations:
- Scopus: 0
- Appears in Collections:
Conference Paper: Fabrication and characterization of Si nanotip arrays for Si-based nano-devices
Title | Fabrication and characterization of Si nanotip arrays for Si-based nano-devices |
---|---|
Authors | |
Keywords | Silicon nanotip Isotropic etching Electron beam lithography |
Issue Date | 2008 |
Publisher | SPIE - International Society for Optical Engineering. The Journal's web site is located at https://www.spiedigitallibrary.org/conference-proceedings-of-spie |
Citation | Proceedings of SPIE - The International Society for Optical Engineering, 2008, v. 6984 How to Cite? |
Abstract | A simple and efficient technique for fabricating two-dimensional arrays of silicon nanotips by using electron beam lithography (EBL) and reactive ion etching (RIE) was reported. For the RIE processes, two kind of reactive gases, CHF3 and SF6, were used as plasma etching source for Si. The experiment results indicate that the reactive ion etching mechanism is different: the isotropic process for SF6 and anisotropic for CHF 3. It is found that the mixed O2/SF6 plasma etching can improve the properties of profile and surface of Si nanotips. Under the condition of ratio ~15%, the 10 nm top size of Si nanotips was obtained. |
Persistent Identifier | http://hdl.handle.net/10722/265535 |
ISSN | 2023 SCImago Journal Rankings: 0.152 |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Zhang, Xiangao | - |
dc.contributor.author | Liu, Kui | - |
dc.contributor.author | Chen, Kunji | - |
dc.contributor.author | Xu, Jun | - |
dc.contributor.author | Ma, Zhongyuan | - |
dc.contributor.author | Li, Wei | - |
dc.contributor.author | Xu, Ling | - |
dc.contributor.author | Huang, Xinfan | - |
dc.date.accessioned | 2018-12-03T01:20:57Z | - |
dc.date.available | 2018-12-03T01:20:57Z | - |
dc.date.issued | 2008 | - |
dc.identifier.citation | Proceedings of SPIE - The International Society for Optical Engineering, 2008, v. 6984 | - |
dc.identifier.issn | 0277-786X | - |
dc.identifier.uri | http://hdl.handle.net/10722/265535 | - |
dc.description.abstract | A simple and efficient technique for fabricating two-dimensional arrays of silicon nanotips by using electron beam lithography (EBL) and reactive ion etching (RIE) was reported. For the RIE processes, two kind of reactive gases, CHF3 and SF6, were used as plasma etching source for Si. The experiment results indicate that the reactive ion etching mechanism is different: the isotropic process for SF6 and anisotropic for CHF 3. It is found that the mixed O2/SF6 plasma etching can improve the properties of profile and surface of Si nanotips. Under the condition of ratio ~15%, the 10 nm top size of Si nanotips was obtained. | - |
dc.language | eng | - |
dc.publisher | SPIE - International Society for Optical Engineering. The Journal's web site is located at https://www.spiedigitallibrary.org/conference-proceedings-of-spie | - |
dc.relation.ispartof | Proceedings of SPIE - The International Society for Optical Engineering | - |
dc.subject | Silicon nanotip | - |
dc.subject | Isotropic etching | - |
dc.subject | Electron beam lithography | - |
dc.title | Fabrication and characterization of Si nanotip arrays for Si-based nano-devices | - |
dc.type | Conference_Paper | - |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1117/12.792018 | - |
dc.identifier.scopus | eid_2-s2.0-42149176230 | - |
dc.identifier.volume | 6984 | - |
dc.identifier.spage | null | - |
dc.identifier.epage | null | - |
dc.identifier.issnl | 0277-786X | - |