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Article: Enhanced thermopower of graphene films with oxygen plasma treatment

TitleEnhanced thermopower of graphene films with oxygen plasma treatment
Authors
Keywordsoxygen plasma
graphene film
thermopower
Issue Date2011
Citation
ACS Nano, 2011, v. 5, n. 4, p. 2749-2755 How to Cite?
AbstractIn this work, we show that the maximum thermopower of few layers graphene (FLG) films could be greatly enhanced up to ∼700 μV/K after oxygen plasma treatment. The electrical conductivities of these plasma treated FLG films remain high, for example, ∼10 S/m, which results in power factors as high as ∼4.5 × 10 W K m . In comparison, the pristine FLG films show a maximum thermopower of ∼80 μV/K with an electrical conductivity of ∼5 × 10 S/m. The proposed mechanism is due to generation of local disordered carbon that opens the band gap. Measured thermopowers of single-layer graphene (SLG) films and reduced graphene oxide (rGO) films were in the range of -40 to 50 and -10 to 20 μV/K, respectively. However, such oxygen plasma treatment is not suitable for SLG and rGO films. The SLG films were easily destroyed during the treatment while the electrical conductivity of rGO films is too low. © 2011 American Chemical Society. 4 -3 -2 -1 4
Persistent Identifierhttp://hdl.handle.net/10722/297971
ISSN
2023 Impact Factor: 15.8
2023 SCImago Journal Rankings: 4.593
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorXiao, Ni-
dc.contributor.authorDong, Xiaochen-
dc.contributor.authorSong, Li-
dc.contributor.authorLiu, Dayong-
dc.contributor.authorTay, Yeeyan-
dc.contributor.authorWu, Shixin-
dc.contributor.authorLi, Lain Jong-
dc.contributor.authorZhao, Yang-
dc.contributor.authorYu, Ting-
dc.contributor.authorZhang, Hua-
dc.contributor.authorHuang, Wei-
dc.contributor.authorHng, Huey Hoon-
dc.contributor.authorAjayan, Pulickel M.-
dc.contributor.authorYan, Qingyu-
dc.date.accessioned2021-04-08T03:07:22Z-
dc.date.available2021-04-08T03:07:22Z-
dc.date.issued2011-
dc.identifier.citationACS Nano, 2011, v. 5, n. 4, p. 2749-2755-
dc.identifier.issn1936-0851-
dc.identifier.urihttp://hdl.handle.net/10722/297971-
dc.description.abstractIn this work, we show that the maximum thermopower of few layers graphene (FLG) films could be greatly enhanced up to ∼700 μV/K after oxygen plasma treatment. The electrical conductivities of these plasma treated FLG films remain high, for example, ∼10 S/m, which results in power factors as high as ∼4.5 × 10 W K m . In comparison, the pristine FLG films show a maximum thermopower of ∼80 μV/K with an electrical conductivity of ∼5 × 10 S/m. The proposed mechanism is due to generation of local disordered carbon that opens the band gap. Measured thermopowers of single-layer graphene (SLG) films and reduced graphene oxide (rGO) films were in the range of -40 to 50 and -10 to 20 μV/K, respectively. However, such oxygen plasma treatment is not suitable for SLG and rGO films. The SLG films were easily destroyed during the treatment while the electrical conductivity of rGO films is too low. © 2011 American Chemical Society. 4 -3 -2 -1 4-
dc.languageeng-
dc.relation.ispartofACS Nano-
dc.subjectoxygen plasma-
dc.subjectgraphene film-
dc.subjectthermopower-
dc.titleEnhanced thermopower of graphene films with oxygen plasma treatment-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1021/nn2001849-
dc.identifier.scopuseid_2-s2.0-79955375372-
dc.identifier.volume5-
dc.identifier.issue4-
dc.identifier.spage2749-
dc.identifier.epage2755-
dc.identifier.eissn1936-086X-
dc.identifier.isiWOS:000289742100039-
dc.identifier.issnl1936-0851-

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