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Article: Steam-Assisted Chemical Vapor Deposition of Zeolitic Imidazolate Framework

TitleSteam-Assisted Chemical Vapor Deposition of Zeolitic Imidazolate Framework
Authors
Issue Date2020
Citation
ACS Materials Letters, 2020, v. 2, n. 5, p. 485-491 How to Cite?
AbstractDirect growth of metal-organic frameworks (MOFs) on substrates is a prerequisite to incorporating them into functional platforms and microdevices. Nevertheless, available reports mostly rely on the solvent-based routes, typically altered from processes for powder synthesis which are obstacles to the nanofabrication. Besides, although few vapor-phase growth approaches were presented, the proposed procedures required multiple steps, such as matrix deposition and post-conversion, to obtain desired MOF films on substrates. Here, we demonstrate a steam-assisted chemical vapor deposition (CVD) method to directly synthesize highly crystalline ZIF-67 thin films at the temperature <125°C. With a slow deposition rate, the ZIF-67 forms a highly oriented thin film on a c-plane sapphire substrate, indicating the growth is epitaxial. Furthermore, we demonstrate the integration of directly grown CVD ZIF-67 as the active material of chemiresistors onto microelectronic chips. The ZIF-67 chemiresistors exhibit responses to the gas molecules, which are capable of diffusing into the cage of ZIF-67 at room temperature. The proposed synthesis method of ZIF-67 thin films is simple, scalable, cost-effective, and promising for numerous applications.
Persistent Identifierhttp://hdl.handle.net/10722/298358
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorHuang, Jing Kai-
dc.contributor.authorSaito, Noboru-
dc.contributor.authorCai, Yichen-
dc.contributor.authorWan, Yi-
dc.contributor.authorCheng, Chia Chin-
dc.contributor.authorLi, Mengliu-
dc.contributor.authorShi, Junjie-
dc.contributor.authorTamada, Kaoru-
dc.contributor.authorTung, Vincent C.-
dc.contributor.authorLi, Sean-
dc.contributor.authorLi, Lain Jong-
dc.date.accessioned2021-04-08T03:08:14Z-
dc.date.available2021-04-08T03:08:14Z-
dc.date.issued2020-
dc.identifier.citationACS Materials Letters, 2020, v. 2, n. 5, p. 485-491-
dc.identifier.urihttp://hdl.handle.net/10722/298358-
dc.description.abstractDirect growth of metal-organic frameworks (MOFs) on substrates is a prerequisite to incorporating them into functional platforms and microdevices. Nevertheless, available reports mostly rely on the solvent-based routes, typically altered from processes for powder synthesis which are obstacles to the nanofabrication. Besides, although few vapor-phase growth approaches were presented, the proposed procedures required multiple steps, such as matrix deposition and post-conversion, to obtain desired MOF films on substrates. Here, we demonstrate a steam-assisted chemical vapor deposition (CVD) method to directly synthesize highly crystalline ZIF-67 thin films at the temperature <125°C. With a slow deposition rate, the ZIF-67 forms a highly oriented thin film on a c-plane sapphire substrate, indicating the growth is epitaxial. Furthermore, we demonstrate the integration of directly grown CVD ZIF-67 as the active material of chemiresistors onto microelectronic chips. The ZIF-67 chemiresistors exhibit responses to the gas molecules, which are capable of diffusing into the cage of ZIF-67 at room temperature. The proposed synthesis method of ZIF-67 thin films is simple, scalable, cost-effective, and promising for numerous applications.-
dc.languageeng-
dc.relation.ispartofACS Materials Letters-
dc.titleSteam-Assisted Chemical Vapor Deposition of Zeolitic Imidazolate Framework-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1021/acsmaterialslett.0c00026-
dc.identifier.scopuseid_2-s2.0-85085086529-
dc.identifier.volume2-
dc.identifier.issue5-
dc.identifier.spage485-
dc.identifier.epage491-
dc.identifier.eissn2639-4979-
dc.identifier.isiWOS:000530657400008-
dc.identifier.issnl2639-4979-

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