File Download
There are no files associated with this item.
Links for fulltext
(May Require Subscription)
- Publisher Website: 10.1021/acsmaterialslett.0c00026
- Scopus: eid_2-s2.0-85085086529
- WOS: WOS:000530657400008
Supplementary
- Citations:
- Appears in Collections:
Article: Steam-Assisted Chemical Vapor Deposition of Zeolitic Imidazolate Framework
Title | Steam-Assisted Chemical Vapor Deposition of Zeolitic Imidazolate Framework |
---|---|
Authors | |
Issue Date | 2020 |
Citation | ACS Materials Letters, 2020, v. 2, n. 5, p. 485-491 How to Cite? |
Abstract | Direct growth of metal-organic frameworks (MOFs) on substrates is a prerequisite to incorporating them into functional platforms and microdevices. Nevertheless, available reports mostly rely on the solvent-based routes, typically altered from processes for powder synthesis which are obstacles to the nanofabrication. Besides, although few vapor-phase growth approaches were presented, the proposed procedures required multiple steps, such as matrix deposition and post-conversion, to obtain desired MOF films on substrates. Here, we demonstrate a steam-assisted chemical vapor deposition (CVD) method to directly synthesize highly crystalline ZIF-67 thin films at the temperature <125°C. With a slow deposition rate, the ZIF-67 forms a highly oriented thin film on a c-plane sapphire substrate, indicating the growth is epitaxial. Furthermore, we demonstrate the integration of directly grown CVD ZIF-67 as the active material of chemiresistors onto microelectronic chips. The ZIF-67 chemiresistors exhibit responses to the gas molecules, which are capable of diffusing into the cage of ZIF-67 at room temperature. The proposed synthesis method of ZIF-67 thin films is simple, scalable, cost-effective, and promising for numerous applications. |
Persistent Identifier | http://hdl.handle.net/10722/298358 |
ISI Accession Number ID |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Huang, Jing Kai | - |
dc.contributor.author | Saito, Noboru | - |
dc.contributor.author | Cai, Yichen | - |
dc.contributor.author | Wan, Yi | - |
dc.contributor.author | Cheng, Chia Chin | - |
dc.contributor.author | Li, Mengliu | - |
dc.contributor.author | Shi, Junjie | - |
dc.contributor.author | Tamada, Kaoru | - |
dc.contributor.author | Tung, Vincent C. | - |
dc.contributor.author | Li, Sean | - |
dc.contributor.author | Li, Lain Jong | - |
dc.date.accessioned | 2021-04-08T03:08:14Z | - |
dc.date.available | 2021-04-08T03:08:14Z | - |
dc.date.issued | 2020 | - |
dc.identifier.citation | ACS Materials Letters, 2020, v. 2, n. 5, p. 485-491 | - |
dc.identifier.uri | http://hdl.handle.net/10722/298358 | - |
dc.description.abstract | Direct growth of metal-organic frameworks (MOFs) on substrates is a prerequisite to incorporating them into functional platforms and microdevices. Nevertheless, available reports mostly rely on the solvent-based routes, typically altered from processes for powder synthesis which are obstacles to the nanofabrication. Besides, although few vapor-phase growth approaches were presented, the proposed procedures required multiple steps, such as matrix deposition and post-conversion, to obtain desired MOF films on substrates. Here, we demonstrate a steam-assisted chemical vapor deposition (CVD) method to directly synthesize highly crystalline ZIF-67 thin films at the temperature <125°C. With a slow deposition rate, the ZIF-67 forms a highly oriented thin film on a c-plane sapphire substrate, indicating the growth is epitaxial. Furthermore, we demonstrate the integration of directly grown CVD ZIF-67 as the active material of chemiresistors onto microelectronic chips. The ZIF-67 chemiresistors exhibit responses to the gas molecules, which are capable of diffusing into the cage of ZIF-67 at room temperature. The proposed synthesis method of ZIF-67 thin films is simple, scalable, cost-effective, and promising for numerous applications. | - |
dc.language | eng | - |
dc.relation.ispartof | ACS Materials Letters | - |
dc.title | Steam-Assisted Chemical Vapor Deposition of Zeolitic Imidazolate Framework | - |
dc.type | Article | - |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1021/acsmaterialslett.0c00026 | - |
dc.identifier.scopus | eid_2-s2.0-85085086529 | - |
dc.identifier.volume | 2 | - |
dc.identifier.issue | 5 | - |
dc.identifier.spage | 485 | - |
dc.identifier.epage | 491 | - |
dc.identifier.eissn | 2639-4979 | - |
dc.identifier.isi | WOS:000530657400008 | - |
dc.identifier.issnl | 2639-4979 | - |