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Conference Paper: Scalable nanoimprint patterning of thin graphitic oxide sheets and in situ reduction
Title | Scalable nanoimprint patterning of thin graphitic oxide sheets and in situ reduction |
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Authors | |
Issue Date | 2011 |
Citation | Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 2011, v. 29, n. 1, article no. 011023 How to Cite? |
Abstract | This article presents a scalable technique to precisely deposit and pattern graphitic oxide (GO) flakes onto a SiO /Si or glass substrate. A blanket coating of GO was first applied from a colloidal solution onto an amine-functionalized SiO /Si substrate. The amine termination was used to enhance the adhesion of GO sheets to the substrate. A poly(methyl methacrylate) (PMMA) etch mask was patterned via nanoimprint lithography on top of the GO coating. An oxygen plasma etch was then used to remove GO from areas unprotected by the PMMA mask. The PMMA mask was then dissolved by solvent lift-off technique leaving behind GO lines. GO lines down to 250 nm have been demonstrated. Reduction in hydrazine, followed by annealing in hydrogen ambient, increases the conductivity of the patterned GO lines. This technique can enable large-scale fabrication of electronic devices and sensors based on patterned GO sheets. © 2011 American Vacuum Society. 2 2 |
Persistent Identifier | http://hdl.handle.net/10722/298516 |
ISSN | 2023 Impact Factor: 1.5 2023 SCImago Journal Rankings: 0.328 |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | Lee, Yeong Yuh | - |
dc.contributor.author | Chong, Karen S.L. | - |
dc.contributor.author | Goh, Seok Hong | - |
dc.contributor.author | Ng, Andrew M.H. | - |
dc.contributor.author | Kunnavakkam, Madanagopal V. | - |
dc.contributor.author | Hee, Chiou Liu | - |
dc.contributor.author | Xu, Yanping | - |
dc.contributor.author | Tantang, Hosea | - |
dc.contributor.author | Su, Ching Yuan | - |
dc.contributor.author | Li, Lain Jong | - |
dc.date.accessioned | 2021-04-08T03:08:40Z | - |
dc.date.available | 2021-04-08T03:08:40Z | - |
dc.date.issued | 2011 | - |
dc.identifier.citation | Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 2011, v. 29, n. 1, article no. 011023 | - |
dc.identifier.issn | 2166-2746 | - |
dc.identifier.uri | http://hdl.handle.net/10722/298516 | - |
dc.description.abstract | This article presents a scalable technique to precisely deposit and pattern graphitic oxide (GO) flakes onto a SiO /Si or glass substrate. A blanket coating of GO was first applied from a colloidal solution onto an amine-functionalized SiO /Si substrate. The amine termination was used to enhance the adhesion of GO sheets to the substrate. A poly(methyl methacrylate) (PMMA) etch mask was patterned via nanoimprint lithography on top of the GO coating. An oxygen plasma etch was then used to remove GO from areas unprotected by the PMMA mask. The PMMA mask was then dissolved by solvent lift-off technique leaving behind GO lines. GO lines down to 250 nm have been demonstrated. Reduction in hydrazine, followed by annealing in hydrogen ambient, increases the conductivity of the patterned GO lines. This technique can enable large-scale fabrication of electronic devices and sensors based on patterned GO sheets. © 2011 American Vacuum Society. 2 2 | - |
dc.language | eng | - |
dc.relation.ispartof | Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics | - |
dc.title | Scalable nanoimprint patterning of thin graphitic oxide sheets and in situ reduction | - |
dc.type | Conference_Paper | - |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1116/1.3533936 | - |
dc.identifier.scopus | eid_2-s2.0-79551641158 | - |
dc.identifier.volume | 29 | - |
dc.identifier.issue | 1 | - |
dc.identifier.spage | article no. 011023 | - |
dc.identifier.epage | article no. 011023 | - |
dc.identifier.eissn | 2166-2754 | - |
dc.identifier.isi | WOS:000286679400026 | - |
dc.identifier.issnl | 2166-2746 | - |