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Article: Growth of large-sized graphene thin-films by liquid precursor-based chemical vapor deposition under atmospheric pressure

TitleGrowth of large-sized graphene thin-films by liquid precursor-based chemical vapor deposition under atmospheric pressure
Authors
Issue Date2011
Citation
Carbon, 2011, v. 49, n. 11, p. 3672-3678 How to Cite?
AbstractLarge-sized thin-films composed of single- and few-layered graphene have been synthesized by chemical vapor deposition (CVD) on copper foils under atmospheric pressure using ethanol or pentane as the precursor. Confocal Raman measurements, transmission electron microscopy and scanning tunneling microscopy show that the majority part of the obtained films exhibit hexagonal graphene lattice. Optical microscopy and electrical measurements confirm the continuity of these films. It is also found that the CVD-grown graphene films with ethanol as the precursor exhibit lower defect density, higher electrical conductivity, and higher hall mobility than those grown with pentane as the precursor. This liquid-precursor-based atmospheric pressure CVD synthesis provides a new route for simple, inexpensive and safe growth of graphene thin-films. © 2011 Elsevier Ltd. All rights reserved.
Persistent Identifierhttp://hdl.handle.net/10722/298528
ISSN
2023 Impact Factor: 10.5
2023 SCImago Journal Rankings: 2.171
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorDong, Xiaochen-
dc.contributor.authorWang, Peng-
dc.contributor.authorFang, Wenjing-
dc.contributor.authorSu, Ching Yuan-
dc.contributor.authorChen, Yu Hsin-
dc.contributor.authorLi, Lain Jong-
dc.contributor.authorHuang, Wei-
dc.contributor.authorChen, Peng-
dc.date.accessioned2021-04-08T03:08:42Z-
dc.date.available2021-04-08T03:08:42Z-
dc.date.issued2011-
dc.identifier.citationCarbon, 2011, v. 49, n. 11, p. 3672-3678-
dc.identifier.issn0008-6223-
dc.identifier.urihttp://hdl.handle.net/10722/298528-
dc.description.abstractLarge-sized thin-films composed of single- and few-layered graphene have been synthesized by chemical vapor deposition (CVD) on copper foils under atmospheric pressure using ethanol or pentane as the precursor. Confocal Raman measurements, transmission electron microscopy and scanning tunneling microscopy show that the majority part of the obtained films exhibit hexagonal graphene lattice. Optical microscopy and electrical measurements confirm the continuity of these films. It is also found that the CVD-grown graphene films with ethanol as the precursor exhibit lower defect density, higher electrical conductivity, and higher hall mobility than those grown with pentane as the precursor. This liquid-precursor-based atmospheric pressure CVD synthesis provides a new route for simple, inexpensive and safe growth of graphene thin-films. © 2011 Elsevier Ltd. All rights reserved.-
dc.languageeng-
dc.relation.ispartofCarbon-
dc.titleGrowth of large-sized graphene thin-films by liquid precursor-based chemical vapor deposition under atmospheric pressure-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1016/j.carbon.2011.04.069-
dc.identifier.scopuseid_2-s2.0-79958295566-
dc.identifier.volume49-
dc.identifier.issue11-
dc.identifier.spage3672-
dc.identifier.epage3678-
dc.identifier.isiWOS:000292663400031-
dc.identifier.issnl0008-6223-

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