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- Publisher Website: 10.1002/adma.201301244
- Scopus: eid_2-s2.0-84879691489
- PMID: 23703933
- WOS: WOS:000322568400011
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Article: High-gain phototransistors based on a CVD MoS2 monolayer
Title | High-gain phototransistors based on a CVD MoS<inf>2</inf> monolayer |
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Authors | |
Keywords | photogain ambient air phototransistors molybdenum disulfides |
Issue Date | 2013 |
Citation | Advanced Materials, 2013, v. 25, n. 25, p. 3456-3461 How to Cite? |
Abstract | A phototransistor based on a chemical vapor deposited (CVD) MoS monolayer exhibits a high photoresponsivity (2200 A W ) and an excellent photogain (5000). The presence of shallow traps contributes to the persistent photoconductivity. Ambient adsorbates act as p-dopants to MoS , decreasing the carrier mobility, photoresponsivity, and photogain. Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. 2 2 -1 |
Persistent Identifier | http://hdl.handle.net/10722/298588 |
ISSN | 2023 Impact Factor: 27.4 2023 SCImago Journal Rankings: 9.191 |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | Zhang, Wenjing | - |
dc.contributor.author | Huang, Jing Kai | - |
dc.contributor.author | Chen, Chang Hsiao | - |
dc.contributor.author | Chang, Yung Huang | - |
dc.contributor.author | Cheng, Yuh Jen | - |
dc.contributor.author | Li, Lain Jong | - |
dc.date.accessioned | 2021-04-08T03:08:49Z | - |
dc.date.available | 2021-04-08T03:08:49Z | - |
dc.date.issued | 2013 | - |
dc.identifier.citation | Advanced Materials, 2013, v. 25, n. 25, p. 3456-3461 | - |
dc.identifier.issn | 0935-9648 | - |
dc.identifier.uri | http://hdl.handle.net/10722/298588 | - |
dc.description.abstract | A phototransistor based on a chemical vapor deposited (CVD) MoS monolayer exhibits a high photoresponsivity (2200 A W ) and an excellent photogain (5000). The presence of shallow traps contributes to the persistent photoconductivity. Ambient adsorbates act as p-dopants to MoS , decreasing the carrier mobility, photoresponsivity, and photogain. Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. 2 2 -1 | - |
dc.language | eng | - |
dc.relation.ispartof | Advanced Materials | - |
dc.subject | photogain | - |
dc.subject | ambient air | - |
dc.subject | phototransistors | - |
dc.subject | molybdenum disulfides | - |
dc.title | High-gain phototransistors based on a CVD MoS<inf>2</inf> monolayer | - |
dc.type | Article | - |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1002/adma.201301244 | - |
dc.identifier.pmid | 23703933 | - |
dc.identifier.scopus | eid_2-s2.0-84879691489 | - |
dc.identifier.volume | 25 | - |
dc.identifier.issue | 25 | - |
dc.identifier.spage | 3456 | - |
dc.identifier.epage | 3461 | - |
dc.identifier.eissn | 1521-4095 | - |
dc.identifier.isi | WOS:000322568400011 | - |
dc.identifier.issnl | 0935-9648 | - |