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Article: Morphological Instability and Additive-Induced Stabilization in Electrodeposition

TitleMorphological Instability and Additive-Induced Stabilization in Electrodeposition
Authors
Issue Date2002
Citation
Physical Review Letters, 2002, v. 89, n. 21, article no. 215509 How to Cite?
AbstractExperiments show that electrodeposited (ED) films exhibit rough surfaces unless the electrochemical bath contains small quantities of molecular “additive” species. We develop a model for ED with additives which shows the suppression of the morphological instability by preferential additive accumulation near surface protrusions due to complex formation and additive codeposition, and subsequent growth site blocking. Linearly stable growth can be achieved over a wide range of deposition flux at sufficiently large additive bulk concentration. We predict the growth conditions necessary for level surfaces, in good agreement with experiments. © 2002 The American Physical Society.
Persistent Identifierhttp://hdl.handle.net/10722/303205
ISSN
2023 Impact Factor: 8.1
2023 SCImago Journal Rankings: 3.040
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorHaataja, Mikko-
dc.contributor.authorSrolovitz, David J.-
dc.date.accessioned2021-09-15T08:24:50Z-
dc.date.available2021-09-15T08:24:50Z-
dc.date.issued2002-
dc.identifier.citationPhysical Review Letters, 2002, v. 89, n. 21, article no. 215509-
dc.identifier.issn0031-9007-
dc.identifier.urihttp://hdl.handle.net/10722/303205-
dc.description.abstractExperiments show that electrodeposited (ED) films exhibit rough surfaces unless the electrochemical bath contains small quantities of molecular “additive” species. We develop a model for ED with additives which shows the suppression of the morphological instability by preferential additive accumulation near surface protrusions due to complex formation and additive codeposition, and subsequent growth site blocking. Linearly stable growth can be achieved over a wide range of deposition flux at sufficiently large additive bulk concentration. We predict the growth conditions necessary for level surfaces, in good agreement with experiments. © 2002 The American Physical Society.-
dc.languageeng-
dc.relation.ispartofPhysical Review Letters-
dc.titleMorphological Instability and Additive-Induced Stabilization in Electrodeposition-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1103/PhysRevLett.89.215509-
dc.identifier.pmid12443431-
dc.identifier.scopuseid_2-s2.0-0037132290-
dc.identifier.volume89-
dc.identifier.issue21-
dc.identifier.spagearticle no. 215509-
dc.identifier.epagearticle no. 215509-
dc.identifier.eissn1079-7114-
dc.identifier.isiWOS:000179068000038-

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