File Download
There are no files associated with this item.
Links for fulltext
(May Require Subscription)
- Publisher Website: 10.1116/1.576290
- Scopus: eid_2-s2.0-0042177183
- WOS: WOS:A1989U715300154
- Find via
Supplementary
- Citations:
- Appears in Collections:
Article: The effect of vapor incidence angle upon thin-film columnar growth
Title | The effect of vapor incidence angle upon thin-film columnar growth |
---|---|
Authors | |
Issue Date | 1989 |
Citation | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 1989, v. 7, n. 3, p. 1386-1391 How to Cite? |
Abstract | We present a generalized theory for the growth of columnar microstructure in vapor-deposited thin films under the joint influence of a constant uniform deposition flux coming down with an arbitrarily chosen incidence angle, and surface diffusion. The dependences of the zone I to zone II transition temperature, and the characteristic length scales associated with the unstable modes on the deposition angle are predicted. The surface morphology is obtained as a function of vapor incidence angle. For a specific deposition angle, there is a one-parameter family of steady-state surface profiles that corresponds to a range of possible columnar orientation angles, among which only one angle is associated with the tangent rule. These results agree with experimental observations. © 1989, American Vacuum Society. All rights reserved. |
Persistent Identifier | http://hdl.handle.net/10722/303217 |
ISSN | 2023 Impact Factor: 2.4 2023 SCImago Journal Rankings: 0.569 |
ISI Accession Number ID |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Mazor, A. | - |
dc.contributor.author | Bukiet, B. G. | - |
dc.contributor.author | Srolovitz, D. J. | - |
dc.date.accessioned | 2021-09-15T08:24:52Z | - |
dc.date.available | 2021-09-15T08:24:52Z | - |
dc.date.issued | 1989 | - |
dc.identifier.citation | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 1989, v. 7, n. 3, p. 1386-1391 | - |
dc.identifier.issn | 0734-2101 | - |
dc.identifier.uri | http://hdl.handle.net/10722/303217 | - |
dc.description.abstract | We present a generalized theory for the growth of columnar microstructure in vapor-deposited thin films under the joint influence of a constant uniform deposition flux coming down with an arbitrarily chosen incidence angle, and surface diffusion. The dependences of the zone I to zone II transition temperature, and the characteristic length scales associated with the unstable modes on the deposition angle are predicted. The surface morphology is obtained as a function of vapor incidence angle. For a specific deposition angle, there is a one-parameter family of steady-state surface profiles that corresponds to a range of possible columnar orientation angles, among which only one angle is associated with the tangent rule. These results agree with experimental observations. © 1989, American Vacuum Society. All rights reserved. | - |
dc.language | eng | - |
dc.relation.ispartof | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films | - |
dc.title | The effect of vapor incidence angle upon thin-film columnar growth | - |
dc.type | Article | - |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1116/1.576290 | - |
dc.identifier.scopus | eid_2-s2.0-0042177183 | - |
dc.identifier.volume | 7 | - |
dc.identifier.issue | 3 | - |
dc.identifier.spage | 1386 | - |
dc.identifier.epage | 1391 | - |
dc.identifier.eissn | 1520-8559 | - |
dc.identifier.isi | WOS:A1989U715300154 | - |