Grain growth phenomena in films: A Monte Carlo approach

Abstract

A statistical model of microstructural evolution is developed for the evolution of grain structure during deposition. In cases where the atomic mobility on the surface greatly exceeds that in the bulk of the film, the bulk microstructure may be viewed as static while all of the evolution is controlled by the free surface. This leads naturally to a two-dimensional model of microstructural evolution. Since the surface is advancing at a constant rate during deposition there is a linear relationship between time in the two-dimensional model and depth in the film. A Monte Carlo computer simulation technique is described which models the evolution of microstructure in this way. Various driving forces are included. Simulated microstructures in the plane of the film and in the plane perpendicular to the free surface are shown. © 1986, American Vacuum Society. All right reserved.