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- Publisher Website: 10.1016/j.scriptamat.2020.01.019
- Scopus: eid_2-s2.0-85078922234
- WOS: WOS:000517662100016
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Article: Grain growth stagnation in thin films due to shear-coupled grain boundary migration
| Title | Grain growth stagnation in thin films due to shear-coupled grain boundary migration |
|---|---|
| Authors | |
| Keywords | Grain growth Grain boundary migration Thin films Disclinations |
| Issue Date | 2020 |
| Citation | Scripta Materialia, 2020, v. 180, p. 83-87 How to Cite? |
| Abstract | Normal grain growth in thin films attached to a substrate has been considered. It has been shown that shear-coupled grain boundary migration results in the build-up of elastic stresses in the film. A semi-quantitative model of grain growth combining the elements of disclinations theory with the Burke-Turnbull model of normal grain growth has been proposed. It has been shown that shear-coupled grain boundary migration may lead to stagnation of normal grain growth, whereas for high coupling factor values, the grains in the film do not grow at all. Finally, the mechanisms of stress relaxation enabling some grain growth are discussed. |
| Description | Accepted manuscript is available on the publisher website. |
| Persistent Identifier | http://hdl.handle.net/10722/303649 |
| ISSN | 2021 Impact Factor: 6.302 2020 SCImago Journal Rankings: 2.027 |
| ISI Accession Number ID |
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Rabkin, Eugen | - |
| dc.contributor.author | Srolovitz, David J. | - |
| dc.date.accessioned | 2021-09-15T08:25:44Z | - |
| dc.date.available | 2021-09-15T08:25:44Z | - |
| dc.date.issued | 2020 | - |
| dc.identifier.citation | Scripta Materialia, 2020, v. 180, p. 83-87 | - |
| dc.identifier.issn | 1359-6462 | - |
| dc.identifier.uri | http://hdl.handle.net/10722/303649 | - |
| dc.description | Accepted manuscript is available on the publisher website. | - |
| dc.description.abstract | Normal grain growth in thin films attached to a substrate has been considered. It has been shown that shear-coupled grain boundary migration results in the build-up of elastic stresses in the film. A semi-quantitative model of grain growth combining the elements of disclinations theory with the Burke-Turnbull model of normal grain growth has been proposed. It has been shown that shear-coupled grain boundary migration may lead to stagnation of normal grain growth, whereas for high coupling factor values, the grains in the film do not grow at all. Finally, the mechanisms of stress relaxation enabling some grain growth are discussed. | - |
| dc.language | eng | - |
| dc.relation.ispartof | Scripta Materialia | - |
| dc.subject | Grain growth | - |
| dc.subject | Grain boundary migration | - |
| dc.subject | Thin films | - |
| dc.subject | Disclinations | - |
| dc.title | Grain growth stagnation in thin films due to shear-coupled grain boundary migration | - |
| dc.type | Article | - |
| dc.description.nature | link_to_OA_fulltext | - |
| dc.identifier.doi | 10.1016/j.scriptamat.2020.01.019 | - |
| dc.identifier.scopus | eid_2-s2.0-85078922234 | - |
| dc.identifier.volume | 180 | - |
| dc.identifier.spage | 83 | - |
| dc.identifier.epage | 87 | - |
| dc.identifier.isi | WOS:000517662100016 | - |