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Article: The Adatom Concentration Profile: A Paradigm for Understanding Two-Dimensional MoS2 Morphological Evolution in Chemical Vapor Deposition Growth

TitleThe Adatom Concentration Profile: A Paradigm for Understanding Two-Dimensional MoS<inf>2</inf> Morphological Evolution in Chemical Vapor Deposition Growth
Authors
Keywordsmorphology engineering
chemical vapor deposition
phase-field simulation
MoS2
MoS2 dendrite
Issue Date2021
Citation
ACS Nano, 2021, v. 15, n. 4, p. 6839-6848 How to Cite?
AbstractThe two-dimensional (2D) transition metal dichalcogenide (TMD) MoS2 possesses many intriguing electronic and optical properties. Potential technological applications have focused much attention on tuning MoS2 properties through control of its morphologies during growth. In this paper, we present a unified spatial-temporal model for the growth of MoS2 crystals with a full spectrum of shapes from triangles, concave triangles, three-point stars, to dendrites through the concept of the adatom concentration profile (ACP). We perform a series of chemical vapor deposition (CVD) experiments controlling adatom concentration on the substrate and growth temperature and present a method for experimentally measuring the ACP in the vicinity of growing islands. We apply a phase-field model of growth that explicitly considers similar variables (adatom concentration, adatom diffusion, and noise effects) and cross-validate the simulations and experiments through the ACP and island morphologies as a function of physically controllable variables. Our calculations reproduce the experimental observations with high fidelity. The ACP is an alternative paradigm to conceptualize the growth of crystals through time, which is expected to be instrumental in guiding the rational shape engineering of MoS2 crystals.
Persistent Identifierhttp://hdl.handle.net/10722/303775
ISSN
2023 Impact Factor: 15.8
2023 SCImago Journal Rankings: 4.593
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorXu, Jiangang-
dc.contributor.authorSrolovitz, David J.-
dc.contributor.authorHo, Derek-
dc.date.accessioned2021-09-15T08:25:59Z-
dc.date.available2021-09-15T08:25:59Z-
dc.date.issued2021-
dc.identifier.citationACS Nano, 2021, v. 15, n. 4, p. 6839-6848-
dc.identifier.issn1936-0851-
dc.identifier.urihttp://hdl.handle.net/10722/303775-
dc.description.abstractThe two-dimensional (2D) transition metal dichalcogenide (TMD) MoS2 possesses many intriguing electronic and optical properties. Potential technological applications have focused much attention on tuning MoS2 properties through control of its morphologies during growth. In this paper, we present a unified spatial-temporal model for the growth of MoS2 crystals with a full spectrum of shapes from triangles, concave triangles, three-point stars, to dendrites through the concept of the adatom concentration profile (ACP). We perform a series of chemical vapor deposition (CVD) experiments controlling adatom concentration on the substrate and growth temperature and present a method for experimentally measuring the ACP in the vicinity of growing islands. We apply a phase-field model of growth that explicitly considers similar variables (adatom concentration, adatom diffusion, and noise effects) and cross-validate the simulations and experiments through the ACP and island morphologies as a function of physically controllable variables. Our calculations reproduce the experimental observations with high fidelity. The ACP is an alternative paradigm to conceptualize the growth of crystals through time, which is expected to be instrumental in guiding the rational shape engineering of MoS2 crystals.-
dc.languageeng-
dc.relation.ispartofACS Nano-
dc.subjectmorphology engineering-
dc.subjectchemical vapor deposition-
dc.subjectphase-field simulation-
dc.subjectMoS2-
dc.subjectMoS2 dendrite-
dc.titleThe Adatom Concentration Profile: A Paradigm for Understanding Two-Dimensional MoS<inf>2</inf> Morphological Evolution in Chemical Vapor Deposition Growth-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1021/acsnano.0c10474-
dc.identifier.pmid33750113-
dc.identifier.scopuseid_2-s2.0-85104995212-
dc.identifier.volume15-
dc.identifier.issue4-
dc.identifier.spage6839-
dc.identifier.epage6848-
dc.identifier.eissn1936-086X-
dc.identifier.isiWOS:000645436800077-

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