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Article: Temperature‐Dependent Electronic Ground‐State Charge Transfer in van der Waals Heterostructures

TitleTemperature‐Dependent Electronic Ground‐State Charge Transfer in van der Waals Heterostructures
Authors
Keywords2D semiconductors
MoS 2
charge transfer
electron-phonon coupling
molecular dopants
Issue Date2021
PublisherWiley. The Journal's web site is located at http://www.wiley-vch.de/publish/en/journals/alphabeticIndex/2089
Citation
Advanced Materials, 2021, v. 33 n. 29, p. article no. 2008677 How to Cite?
AbstractElectronic charge rearrangement between components of a heterostructure is the fundamental principle to reach the electronic ground state. It is acknowledged that the density of state distribution of the components governs the amount of charge transfer, but a notable dependence on temperature is not yet considered, particularly for weakly interacting systems. Here, it is experimentally observed that the amount of ground-state charge transfer in a van der Waals heterostructure formed by monolayer MoS2 sandwiched between graphite and a molecular electron acceptor layer increases by a factor of 3 when going from 7 K to room temperature. State-of-the-art electronic structure calculations of the full heterostructure that accounts for nuclear thermal fluctuations reveal intracomponent electron–phonon coupling and intercomponent electronic coupling as the key factors determining the amount of charge transfer. This conclusion is rationalized by a model applicable to multicomponent van der Waals heterostructures.
DescriptionHybrid open access
Persistent Identifierhttp://hdl.handle.net/10722/305828
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorPark, S-
dc.contributor.authorWang, H-
dc.contributor.authorSchultz, T-
dc.contributor.authorShin, D-
dc.contributor.authorOvsyannikov, R-
dc.contributor.authorZacharias, M-
dc.contributor.authorMaksimov, D-
dc.contributor.authorMeissner, M-
dc.contributor.authorHasegawa, Y-
dc.contributor.authorYamaguchi, T-
dc.contributor.authorKera, S-
dc.contributor.authorAljarb, A-
dc.contributor.authorHakami, M-
dc.contributor.authorLi, L-
dc.contributor.authorTung, V-
dc.contributor.authorAmsalem, P-
dc.contributor.authorRossi, M-
dc.contributor.authorKoch, N-
dc.date.accessioned2021-10-20T10:14:54Z-
dc.date.available2021-10-20T10:14:54Z-
dc.date.issued2021-
dc.identifier.citationAdvanced Materials, 2021, v. 33 n. 29, p. article no. 2008677-
dc.identifier.urihttp://hdl.handle.net/10722/305828-
dc.descriptionHybrid open access-
dc.description.abstractElectronic charge rearrangement between components of a heterostructure is the fundamental principle to reach the electronic ground state. It is acknowledged that the density of state distribution of the components governs the amount of charge transfer, but a notable dependence on temperature is not yet considered, particularly for weakly interacting systems. Here, it is experimentally observed that the amount of ground-state charge transfer in a van der Waals heterostructure formed by monolayer MoS2 sandwiched between graphite and a molecular electron acceptor layer increases by a factor of 3 when going from 7 K to room temperature. State-of-the-art electronic structure calculations of the full heterostructure that accounts for nuclear thermal fluctuations reveal intracomponent electron–phonon coupling and intercomponent electronic coupling as the key factors determining the amount of charge transfer. This conclusion is rationalized by a model applicable to multicomponent van der Waals heterostructures.-
dc.languageeng-
dc.publisherWiley. The Journal's web site is located at http://www.wiley-vch.de/publish/en/journals/alphabeticIndex/2089-
dc.relation.ispartofAdvanced Materials-
dc.rightsThis work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.-
dc.subject2D semiconductors-
dc.subjectMoS 2-
dc.subjectcharge transfer-
dc.subjectelectron-phonon coupling-
dc.subjectmolecular dopants-
dc.titleTemperature‐Dependent Electronic Ground‐State Charge Transfer in van der Waals Heterostructures-
dc.typeArticle-
dc.identifier.emailLi, L: lanceli1@hku.hk-
dc.identifier.authorityLi, L=rp02799-
dc.description.naturepublished_or_final_version-
dc.identifier.doi10.1002/adma.202008677-
dc.identifier.pmid34032324-
dc.identifier.scopuseid_2-s2.0-85106264247-
dc.identifier.hkuros327587-
dc.identifier.volume33-
dc.identifier.issue29-
dc.identifier.spagearticle no. 2008677-
dc.identifier.epagearticle no. 2008677-
dc.identifier.isiWOS:000653748100001-

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