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Article: Integrating band engineering with point defect scattering for high thermoelectric performance in Bi2Si2Te6
Title | Integrating band engineering with point defect scattering for high thermoelectric performance in Bi2Si2Te6 |
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Authors | |
Issue Date | 2022 |
Citation | Chemical Engineering Journal, 2022, v. 441, p. 135968 How to Cite? |
Persistent Identifier | http://hdl.handle.net/10722/314690 |
DC Field | Value | Language |
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dc.contributor.author | Chen, C | - |
dc.contributor.author | Shen, D | - |
dc.contributor.author | Xia, C | - |
dc.contributor.author | Zhang, Z | - |
dc.contributor.author | Wang, W | - |
dc.contributor.author | Zhang, Q | - |
dc.contributor.author | Chen, Y | - |
dc.date.accessioned | 2022-08-05T09:32:50Z | - |
dc.date.available | 2022-08-05T09:32:50Z | - |
dc.date.issued | 2022 | - |
dc.identifier.citation | Chemical Engineering Journal, 2022, v. 441, p. 135968 | - |
dc.identifier.uri | http://hdl.handle.net/10722/314690 | - |
dc.language | eng | - |
dc.relation.ispartof | Chemical Engineering Journal | - |
dc.title | Integrating band engineering with point defect scattering for high thermoelectric performance in Bi2Si2Te6 | - |
dc.type | Article | - |
dc.identifier.email | Chen, Y: yuechen@hku.hk | - |
dc.identifier.authority | Chen, Y=rp01925 | - |
dc.identifier.hkuros | 334980 | - |
dc.identifier.volume | 441 | - |
dc.identifier.spage | 135968 | - |
dc.identifier.epage | 135968 | - |