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Conference Paper: Solid-state electrochemical stamping of functional metallic nanostructures

TitleSolid-state electrochemical stamping of functional metallic nanostructures
Authors
KeywordsElectrochemistry
Nanoimprint lithography
Nanophotonics
Solid state ionics
Surface enhanced raman spectroscopy
Issue Date2007
Citation
2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007, Proceedings, 2007, p. 162-165 How to Cite?
AbstractA new approach of directly patterning metal at nano-scale with excellent dimensional resolution and flexibility is introduced for fabrication of functional nano-structures. This technique is based on the solid-state electrochemical dissolution of a metallic substrate at its contact with a pre-patterned surface of a solid electrolyte tool, and the subsequent formation of the complimentary pattern on the metal substrate as the solid electrolyte etches through the metal layer. Our results demonstrate repeatable and high-fidelity patterning of metal structures with a wide dimension range (20μm to 50nm). As this process is carried out in ambient environment and does not require wet chemicals, its potential for use as a simple and yet high-throughput metal patterning technique offers a highly competitive approach to fabricating functional structures and devices such as chemical sensors and photonic devices. © 2007 IEEE.
Persistent Identifierhttp://hdl.handle.net/10722/318451

 

DC FieldValueLanguage
dc.contributor.authorHsu, Keng-
dc.contributor.authorSchultz, Peter-
dc.contributor.authorFerreira, Placid-
dc.contributor.authorFang, Nicholas-
dc.date.accessioned2022-10-11T12:23:47Z-
dc.date.available2022-10-11T12:23:47Z-
dc.date.issued2007-
dc.identifier.citation2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007, Proceedings, 2007, p. 162-165-
dc.identifier.urihttp://hdl.handle.net/10722/318451-
dc.description.abstractA new approach of directly patterning metal at nano-scale with excellent dimensional resolution and flexibility is introduced for fabrication of functional nano-structures. This technique is based on the solid-state electrochemical dissolution of a metallic substrate at its contact with a pre-patterned surface of a solid electrolyte tool, and the subsequent formation of the complimentary pattern on the metal substrate as the solid electrolyte etches through the metal layer. Our results demonstrate repeatable and high-fidelity patterning of metal structures with a wide dimension range (20μm to 50nm). As this process is carried out in ambient environment and does not require wet chemicals, its potential for use as a simple and yet high-throughput metal patterning technique offers a highly competitive approach to fabricating functional structures and devices such as chemical sensors and photonic devices. © 2007 IEEE.-
dc.languageeng-
dc.relation.ispartof2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007, Proceedings-
dc.subjectElectrochemistry-
dc.subjectNanoimprint lithography-
dc.subjectNanophotonics-
dc.subjectSolid state ionics-
dc.subjectSurface enhanced raman spectroscopy-
dc.titleSolid-state electrochemical stamping of functional metallic nanostructures-
dc.typeConference_Paper-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1109/NANO.2007.4601162-
dc.identifier.scopuseid_2-s2.0-52949085143-
dc.identifier.spage162-
dc.identifier.epage165-

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