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Article: Design and optimization of a light-emitting diode projection micro-stereolithography three-dimensional manufacturing system

TitleDesign and optimization of a light-emitting diode projection micro-stereolithography three-dimensional manufacturing system
Authors
Issue Date2012
Citation
Review of Scientific Instruments, 2012, v. 83, n. 12, article no. 125001 How to Cite?
AbstractThe rapid manufacture of complex three-dimensional micro-scale components has eluded researchers for decades. Several additive manufacturing options have been limited by either speed or the ability to fabricate true three-dimensional structures. Projection micro-stereolithography (PμSL) is a low cost, high throughput additive fabrication technique capable of generating three-dimensional microstructures in a bottom-up, layer by layer fashion. The PμSL system is reliable and capable of manufacturing a variety of highly complex, three-dimensional structures from micro- to meso-scales with micro-scale architecture and submicron precision. Our PμSL system utilizes a reconfigurable digital mask and a 395 nm light-emitting diode (LED) array to polymerize a liquid monomer in a layer-by-layer manufacturing process. This paper discusses the critical process parameters that influence polymerization depth and structure quality. Experimental characterization and performance of the LED-based PμSL system for fabricating highly complex three-dimensional structures for a large range of applications is presented. © 2012 American Institute of Physics.
Persistent Identifierhttp://hdl.handle.net/10722/318529
ISSN
2021 Impact Factor: 1.843
2020 SCImago Journal Rankings: 0.605
ISI Accession Number ID
Errata

 

DC FieldValueLanguage
dc.contributor.authorZheng, Xiaoyu-
dc.contributor.authorDeotte, Joshua-
dc.contributor.authorAlonso, Matthew P.-
dc.contributor.authorFarquar, George R.-
dc.contributor.authorWeisgraber, Todd H.-
dc.contributor.authorGemberling, Steven-
dc.contributor.authorLee, Howon-
dc.contributor.authorFang, Nicholas-
dc.contributor.authorSpadaccini, Christopher M.-
dc.date.accessioned2022-10-11T12:23:58Z-
dc.date.available2022-10-11T12:23:58Z-
dc.date.issued2012-
dc.identifier.citationReview of Scientific Instruments, 2012, v. 83, n. 12, article no. 125001-
dc.identifier.issn0034-6748-
dc.identifier.urihttp://hdl.handle.net/10722/318529-
dc.description.abstractThe rapid manufacture of complex three-dimensional micro-scale components has eluded researchers for decades. Several additive manufacturing options have been limited by either speed or the ability to fabricate true three-dimensional structures. Projection micro-stereolithography (PμSL) is a low cost, high throughput additive fabrication technique capable of generating three-dimensional microstructures in a bottom-up, layer by layer fashion. The PμSL system is reliable and capable of manufacturing a variety of highly complex, three-dimensional structures from micro- to meso-scales with micro-scale architecture and submicron precision. Our PμSL system utilizes a reconfigurable digital mask and a 395 nm light-emitting diode (LED) array to polymerize a liquid monomer in a layer-by-layer manufacturing process. This paper discusses the critical process parameters that influence polymerization depth and structure quality. Experimental characterization and performance of the LED-based PμSL system for fabricating highly complex three-dimensional structures for a large range of applications is presented. © 2012 American Institute of Physics.-
dc.languageeng-
dc.relation.ispartofReview of Scientific Instruments-
dc.titleDesign and optimization of a light-emitting diode projection micro-stereolithography three-dimensional manufacturing system-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1063/1.4769050-
dc.identifier.pmid23278017-
dc.identifier.scopuseid_2-s2.0-84875410151-
dc.identifier.volume83-
dc.identifier.issue12-
dc.identifier.spagearticle no. 125001-
dc.identifier.epagearticle no. 125001-
dc.identifier.isiWOS:000312834300053-
dc.relation.erratumdoi:10.1063/1.4773408-
dc.relation.erratumeid:eid_2-s2.0-84874056587-

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