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Article: Direct visualization of beam-resist interaction volume for sub-nanometer helium ion beam-lithography

TitleDirect visualization of beam-resist interaction volume for sub-nanometer helium ion beam-lithography
Authors
Deng, YSZhuang, XWang, WGu, RHe, DSWang, LCheng, X
Issue Date2021
PublisherIOP Publishing Ltd. The Journal's web site is located at http://www.iop.org/journals/nano
Citation
Nanotechnology, 2021, v. 32 n. 41, p. 415302 How to Cite?
DOI: http://dx.doi.org/10.1088/1361-6528/ac1099
Persistent Identifierhttp://hdl.handle.net/10722/322988
ISI Accession Number ID
WOS:000675613400001

 

DC FieldValueLanguage
dc.contributor.authorDeng, YS-
dc.contributor.authorZhuang, X-
dc.contributor.authorWang, W-
dc.contributor.authorGu, R-
dc.contributor.authorHe, DS-
dc.contributor.authorWang, L-
dc.contributor.authorCheng, X-
dc.date.accessioned2022-11-18T11:46:25Z-
dc.date.available2022-11-18T11:46:25Z-
dc.date.issued2021-
dc.identifier.citationNanotechnology, 2021, v. 32 n. 41, p. 415302-
dc.identifier.urihttp://hdl.handle.net/10722/322988-
dc.languageeng-
dc.publisherIOP Publishing Ltd. The Journal's web site is located at http://www.iop.org/journals/nano-
dc.relation.ispartofNanotechnology-
dc.titleDirect visualization of beam-resist interaction volume for sub-nanometer helium ion beam-lithography-
dc.typeArticle-
dc.identifier.emailWang, L: lqwang@hku.hk-
dc.identifier.authorityWang, L=rp00184-
dc.identifier.doi10.1088/1361-6528/ac1099-
dc.identifier.hkuros342533-
dc.identifier.volume32-
dc.identifier.issue41-
dc.identifier.spage415302-
dc.identifier.epage415302-
dc.identifier.isiWOS:000675613400001-
dc.publisher.placeEngland-

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