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Article: Effect of Zr addition on microstructure and mechanical properties of CoCrFeNiZr x high-entropy alloy thin films

TitleEffect of Zr addition on microstructure and mechanical properties of CoCrFeNiZr<inf> x</inf> high-entropy alloy thin films
Authors
KeywordsDeformation mechanism
Hardness
High-entropy alloys
Microstructure
Sputtering
Thin films
Issue Date2021
Citation
Applied Nanoscience (Switzerland), 2021, v. 11, n. 3, p. 771-776 How to Cite?
AbstractAs the technology of microscale devices evolves to smaller dimensions, the newly surged high-entropy alloys (HEAs), in particular high entropy alloy thin films (HEAFs), manifest excellent properties for practical applications. However, limited studies to date focused on microstructures and their impact on mechanical properties of HEAFs. In this work, we systematically investigated the relationship between microstructure and mechanical properties of CoCrFeNiZrx (x = 0, 0.3, 0.5, 1) high-entropy alloy thin films. A transition from single-phase crystal to amorphous structure was observed with increasing Zr concentration from 0 to 20.7 at.%. In the intermediate Zr concentration ranging from 7.0 to 12.9 at.%, Zr addition renders a crystal–amorphous dual-phase structure with Zr element segregation and a peak hardness of 6.7 GPa. These findings not only provide deep insight into understanding alloying effects on microstructure evolution and mechanical properties of HEAFs, but also present valuable information for designing ultrastrong high-entropy alloys for practical applications, such as microelectronic devices, lightweight lattices and advanced coating industry.
Persistent Identifierhttp://hdl.handle.net/10722/326217
ISSN
2021 Impact Factor: 3.869
2023 SCImago Journal Rankings: 0.512
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorFeng, Xiaobin-
dc.contributor.authorFan, Sufeng-
dc.contributor.authorMeng, Fanling-
dc.contributor.authorSurjadi, James Utama-
dc.contributor.authorCao, Ke-
dc.contributor.authorLiao, Weibing-
dc.contributor.authorLu, Yang-
dc.date.accessioned2023-03-09T09:58:58Z-
dc.date.available2023-03-09T09:58:58Z-
dc.date.issued2021-
dc.identifier.citationApplied Nanoscience (Switzerland), 2021, v. 11, n. 3, p. 771-776-
dc.identifier.issn2190-5509-
dc.identifier.urihttp://hdl.handle.net/10722/326217-
dc.description.abstractAs the technology of microscale devices evolves to smaller dimensions, the newly surged high-entropy alloys (HEAs), in particular high entropy alloy thin films (HEAFs), manifest excellent properties for practical applications. However, limited studies to date focused on microstructures and their impact on mechanical properties of HEAFs. In this work, we systematically investigated the relationship between microstructure and mechanical properties of CoCrFeNiZrx (x = 0, 0.3, 0.5, 1) high-entropy alloy thin films. A transition from single-phase crystal to amorphous structure was observed with increasing Zr concentration from 0 to 20.7 at.%. In the intermediate Zr concentration ranging from 7.0 to 12.9 at.%, Zr addition renders a crystal–amorphous dual-phase structure with Zr element segregation and a peak hardness of 6.7 GPa. These findings not only provide deep insight into understanding alloying effects on microstructure evolution and mechanical properties of HEAFs, but also present valuable information for designing ultrastrong high-entropy alloys for practical applications, such as microelectronic devices, lightweight lattices and advanced coating industry.-
dc.languageeng-
dc.relation.ispartofApplied Nanoscience (Switzerland)-
dc.subjectDeformation mechanism-
dc.subjectHardness-
dc.subjectHigh-entropy alloys-
dc.subjectMicrostructure-
dc.subjectSputtering-
dc.subjectThin films-
dc.titleEffect of Zr addition on microstructure and mechanical properties of CoCrFeNiZr<inf> x</inf> high-entropy alloy thin films-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1007/s13204-019-01057-7-
dc.identifier.scopuseid_2-s2.0-85083040946-
dc.identifier.volume11-
dc.identifier.issue3-
dc.identifier.spage771-
dc.identifier.epage776-
dc.identifier.eissn2190-5517-
dc.identifier.isiWOS:000626936200005-

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